动态磁场矩形平面磁控靶开发  

Development of Rectangular Planar Magnetic Control Target with Dynamic Magnetic Field

作　　者：刘文丽 刘旭 尹翔 LIU Wen-li;LIU Xu;YIN Xiang(Beijing NAURA Vacuum Technology Co.,Ltd.,Beijing 100015,China)

机构地区：[1]北京北方华创真空技术有限公司,北京100015

出　　处：《真空》2023年第5期47-50,共4页Vacuum

摘　　要：针对矩形磁控溅射靶使用过程中靶材利用率较低的问题,北京北方华创真空技术有限公司设计生产了磁铁组件可水平垂直移动的动态磁场矩形平面磁控靶。设备通过电机带动磁铁组件沿靶材宽度方向扫描,使刻蚀跑道在靶面宽度方向拓展,增大靶面可被刻蚀的区域面积,亦通过电机调节磁铁组件垂直方向高度,减小靶材表面磁场强度相对变化,以提高靶材利用率。测试实验表明该动态磁场矩形平面磁控靶的靶材利用率提高至55%~60%,大大降低了生产成本,目前设备已获得行业用户的认可。To solve the problem of low target utilization rate during the use of rectangular magnetron sputtering targets,NAURA designed and fabricated a rectangular planar magnetic control target with dynamic magnetic field whose magnet components can move horizontally and vertically.The equipment drives the magnet assembly to scan along the width direction of the target material through the motor,so that the etching track expands in the width direction on the target surface,the etched area of the target surface increases,and the utilization rate of the target material improves.The vertical height of the magnet assembly is adjusted by the motor to reduce the relative change of the magnetic field intensity on the surface of the target material and to improve the utilization rate of the target material.The test results show that the target utilization rate of the dynamic magnetic field rectangular planar magnetic control target designed and fabricated by NAURA increases to 55%~60%,which greatly reduces the production cost.At present,the equipment has been recognized by industry customers.

关 键 词：磁控溅射 矩形平面靶 靶材利用率 扫描磁场 

分 类 号：TB43[一般工业技术] O461[理学—电子物理学]