光栅阀角度对电弧离子镀TiN薄膜结构及性能的影响  

Effect of Grating Valve Angle on Structure and Properties of Arc Ion Plated TiN Films

作　　者：赵彦辉[1] 杨文进[1] ZHAO Yanhui;YANG Wenjin(Surface Engineering of Materials Division,Institute of Metal Research Chinese Academy of Sciences,Shenyang 110016,China)

机构地区：[1]中国科学院金属研究所材料表面工程研究部,辽宁沈阳110016

出　　处：《沈阳大学学报（自然科学版）》2023年第6期459-463,470,共6页Journal of Shenyang University：Natural Science

摘　　要：通过调整光栅阀角度开展对电弧离子镀TiN薄膜结构及力学性能的研究。实验结果表明:光栅阀角度对TiN薄膜的择优取向无明显影响,薄膜均以TiN(200)面择优取向为主;随着光栅阀角度的增加,TiN薄膜中N与Ti原子比均呈欠化学计量比,且先增加而后降低,在光栅阀角度为10°时N与Ti原子比最高;TiN薄膜表面粗糙度随着光栅阀角度增加整体呈增加趋势;在光栅阀角度为10°时,TiN薄膜呈现出最高硬度和最低磨损率,具有最佳力学和耐磨性能。在电弧离子镀真空镀膜过程中,光栅阀角度通过影响气体流量进而影响薄膜性能,但对于TiN薄膜结构无明显影响,只有选择合适的光栅阀角度才能有助于薄膜综合性能的改善。By adjusting the grating valve angle,studies on the structure and mechanical properties of TiN films deposited by arc ion plating were performed.The experimental results showed that the grating valve angle had no significant effect on the preferred orientation of TiN film,the films showed TiN(200)preferred orientation.With the increase of grating angle valve,N and Ti atomic percent content ratio in TiN films were substoichiometric,and first increased and then decreased,the highest N and Ti atomic percent content ratio was obtained at the grating valve angle of 10°.Surface roughness Ra of TiN thin films showed an increasing trend with the grating valve angle.The highest hardness value and the low wear rate were obtained at the grating valve angle of 10°,which presented the optimal mechanical and wear-resistant properties of TiN films.During film vacuum deposition by arc ion plating,the grating valve angle would affect film performance by influencing gas flow,but it had no significant effect on TiN film structure.By choosing the appropriate grating valve angle,the optimized performance of the thin films would be obtained.

关 键 词：电弧离子镀 光栅阀角度 TIN薄膜 硬度 耐磨性能 

分 类 号：TB43[一般工业技术]