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作 者:李孝凯 尹善 王进平 徐清国 郭朝乾 LI Xiaokai;YIN Shan;WANG Jinping;XU Qingguo;GUO Chaoqian(Guangdong Huasheng Nanotechnology Co.,Ltd.,Dongguan523000,Guangdong,China)
机构地区:[1]广东华升纳米科技股份有限公司,广东东莞523000
出 处:《真空与低温》2024年第1期23-30,共8页Vacuum and Cryogenics
基 金:国家自然科学基金(52101081)。
摘 要:随着对材料需求的日渐增长,在材料表面沉积性能优异的薄膜以提高材料的使用性能成为一种趋势。类金刚石薄膜具有高硬度、强的耐腐蚀性能、低摩擦因数、良好的耐磨损性等优势,在工业制造领域受到越来越多的关注。介绍了电子回旋共振等离子体源和表面波等离子体源的原理及在制备DLC薄膜中的应用,分析了沉积过程中影响DLC薄膜性能的主要因素,指出了目前存在的问题,总结了微波等离子体源能够产生大面积的高密度等离子体,且无电极污染等优势,为促进高性能DLC薄膜的制备和应用提供参考。With the increasing demand for materials,it has become a trend to deposit excellent films on the surface of materials to improve the performance of materials.Diamond-like carbon film has the advantages of high hardness,strong corrosion resistance,low friction coefficient,good wear resistance,and attracts more and more attention in the field of industrial manufacturing.This paper introduces the principle of electronic rotary resonance plasma source and surface wave plasma source and their application in the preparation of DLC film,analyzes the main factors affecting the performance of the DLC film during deposition,points out the existing problems,and summarizes that microwave plasma source can produce large area of high density plasma,without electrode contamination,which provides reference for promoting the preparation and application of high-performance DLC film.
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