退火温度对Ta_(2)O_(5)薄膜光学和表面特性的影响  

Effect of Annealing Temperature on Optical Properties and Surface Properties of Ta_(2)O_(5)Thin Films

作　　者：李坤[1] 何延春[1] 王兰喜[1] 周超[1] 贺颖 王虎[1] 王艺[1] 熊玉卿[1] LI Kun;HE Yanchun;WANG Lanxi;ZHOU Chao;HE Ying;WANG Hu;WANG Yi;XIONG Yuqing(Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730000,China)

机构地区：[1]兰州空间技术物理研究所真空技术与物理重点实验室,兰州730000

出　　处：《真空与低温》2024年第1期78-82,共5页Vacuum and Cryogenics

基　　金：重点实验室基金(HTKJ2021KL510003)。

摘　　要：针对退火温度影响Ta_(2)O_(5)薄膜的光学和表面特性的问题,采用电子束蒸发技术在石英基底上制备了该薄膜,并将薄膜样品分别在200℃、400℃和600℃下进行退火。利用光谱仪测试了薄膜的透射率并反演计算得到薄膜的折射率和消光系数的变化规律,采用X射线衍射仪和原子力显微镜表征了薄膜的表面性能。研究表明,薄膜透射率曲线的峰值随退火温度升高而显著提升。随着退火温度升高,薄膜的折射率和消光系数均逐渐变大,表面粗糙度呈现下降的趋势,表面变得致密。退火前后薄膜均为非晶态。该研究为进一步提高Ta_(2)O_(5)薄膜的性能提供了试验数据。The effect of annealing temperature on the optical and surface properties of Ta_(2)O_(5)films has been investigated.The thin films were prepared on quartz substrate by electron beam evaporation technique and annealed at 200℃,400℃and 600℃respectively.The transmissibility of the films was measured by spectrograph,and the variation of refractive index and extinction coefficient were obtained by inversion calculation.The surface properties of the films were characterized by X-ray diffraction and atomic force microscopy.The results show that the maximum value of the transmittance curve of the films increase significantly with the increase of annealing temperature.With the increase of annealing temperature,the refractive index and extinction coefficient of Ta_(2)O_(5)film increase gradually,while the surface roughness of the film decreases,and the surface of films becomes dense.Both deposited and annealed films are amorphous.This study provides experimental data for further improving the performance of Ta_(2)O_(5)thin films.

关 键 词：Ta_(2)O_(5)薄膜 退火温度 光学 表面 

分 类 号：O484.41[理学—固体物理]