光刻技术科学知识图谱和多维主题分析  

Lithography Technical Science Knowledge Map and Multidimensional Theme Analysis

作　　者：李兵 车尧[2] 徐辉 张志刚 周洪[3,4] Li Bing;Che Yao;Xu Hui;Zhang Zhigang;Zhou Hong(Exchange&Development&Service Center of Science&Technology Talents of The Ministry of Science&Technology,Beijing 100045,China;Institute of Scientific and Technical Information of China,Beijing 100038,China;Wuhan Document and Information Center,Chinese Academy of Sciences,Wuhan 430071,Hubei,China;Department of Information Resources Management,School of Economics and Management,University of Chinese Academy of Sciences,Beijing 100191,China)

机构地区：[1]科学技术部科技人才交流开发服务中心,北京100045 [2]中国科学技术信息研究所,北京100038 [3]中国科学院武汉文献情报中心,湖北武汉430071 [4]中国科学院大学经济与管理学院信息资源管理系,北京100191

出　　处：《激光与光电子学进展》2023年第23期32-41,共10页Laser & Optoelectronics Progress

摘　　要：基于光刻技术领域相关论文和全球“高被引科学家”名单,分析了光刻技术领域的研究时间和国家、研究机构、研究资助机构及高水平基础研究人才的分布特征,并在此基础上开展光刻领域论文的文献计量分析,分析光刻领域的研究方向、主题和发展趋势。结果表明,目前光刻技术论文产出呈现下降趋势,美国在该研究领域具有领先优势,光学光刻及掩模、光刻胶及电子束光刻、极紫外(EUV)光刻等技术主题研究仍以国外机构为主。我国已开展布局高数值孔径EUV光刻、导向自组装光刻、石墨烯基材料、机器学习的应用等新兴主题。本文提出光刻技术研发的总体布局、研究机构、企业力量、人才机制的建议,以期为相关领域决策和研究提供科学依据。Based on earlier reports in the lithography technology field and global list of“highly-cited scientists”,the research time and distribution characteristics of countries,research institutions,research funding institutions,and highlevel basic research talents in the lithography technology are analyzed.Based on these two aspects,a bibliometric analysis of published works in the lithography technology field was performed to investigate the research direction,themes,and development trends in this field.The results show that the output of lithography technology papers is currently declining,and the United States has a leading edge in this research field.Research on optical lithography and masking,photoresist and electron beam lithography,extreme ultraviolet(EUV)lithography,and other technical topics is still dominated by foreign institutions.China has launched research on emerging themes,including high-numerical-aperture EUV lithography,guided self-assembly lithography,graphene-based materials,and machine learning applications.This study proposes suggestions for improving the overall layout,involved research institutions,enterprise strength,and talent mechanism of lithography technology research and development to provide a scientific basis for decision-making and research directions in related fields.

关 键 词：光刻技术 科学知识图谱 多维主题分析 基础研究 高被引科学家 

分 类 号：G316[文化科学]