Bi_(2)O_(3)电致变色薄膜的膜厚甄选  

Thickness selection of Bi_(2)O_(3) electrochromic films

作　　者：吴浩 赵加栋 刘春雨[1] 俞圣雯[1] WU Hao;ZHAO Jindong;LIU Chunyu;YU Shengwen(School of Matprials Science and Engincering,Shanghai University,Shanghai 200444,China)

机构地区：[1]上海大学材料科学与工程学院,上海200444

出　　处：《上海大学学报（自然科学版）》2024年第1期43-53,共11页Journal of Shanghai University:Natural Science Edition

摘　　要：为了得到能够呈现出合理电致变色性能的Bi_(2)O_(3)薄膜,需要筛选其膜厚.通过磁控溅射法制备得到厚度为20~300 nm的Bi_(2)O_(3)薄膜,并利用UH4150紫外可见(ultravioletvisible,UV-Vis)分光光度计和CHI-660e电化学工作站测试薄膜的电致变色性能.采用扫描电子显微镜(scanning electron microscope,SEM)和X射线衍射仪(X-ray diffraction,XRD)分别检测了薄膜的表面形貌和物相结构.对变色对比度(ΔT_(λ=550 nm))、电致变色效率(η)以及性能保留度(R_(ΔT)、R_(η))的表现进行综合甄别,发现膜厚介于60~120 nm之间的Bi_(2)O_(3)薄膜的ΔT和η分别达到25%和10 cm^(2)/C,并且具有较高的电致变色性能保留度(R_(ΔT)=20%、R_(η)=44.6%).这可能与该厚度区间薄膜的主要物相为具有较高离子导电性的δ相有关.It is necessary to select appropriate thickness for the fabrication of Bi_(2)O_(3) thin films with reasonable electrochromic properties.Bi_(2)O_(3) thin films with an approximate range of 20~300 nm in thickness were prepared by magnetron sputtering.The electrochromic properties of the films were analyzed by using ultraviolet-visible(UV-Vis)spectrophotometry and an electrochemical workstation.The surface morphology and phase structure of the thin films were investigated by scanning electron microscope(SEM)and X-ray diffraction(XRD).After comprehensive screening to assess their performance in terms of the color change contrast(ΔT_(λ=550 nm)),electrochromic efficiency(η),and performance retention(R_(ΔT),R_(η)),the values ofΔT andηof Bi_(2)O_(3) thin films with a thickness between60 nm and 120 nm were found to reach 25%and 10 cm^(2)/C,respectively.Furthermore,the retention of the electrochromic properties(R_(ΔT)=20%,R_(η)=44.6%)is high.This may be related to the fact that the main phase of the film in this thickness range is δ,which is characterized by high ionic conductivity.

关 键 词：膜厚 氧化铋 电致变色 薄膜 

分 类 号：TB321[一般工业技术—材料科学与工程]