部分刻蚀光栅对衍射光束影响的仿真研究  

Simulation of the effects of partial etched gratings on diffracted beams

作　　者：钱峻 谢静雅 QIAN Jun;XIE Jingya(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China)

机构地区：[1]上海理工大学光电信息与计算机工程学院,上海200093

出　　处：《光学仪器》2024年第1期49-54,共6页Optical Instruments

摘　　要：为了研究部分刻蚀光栅对波导光栅衍射光束的影响,提高集成光子学设计自由度,通过有限时域差分法仿真分析了分别在光栅边缘或中间进行波导部分刻蚀后的不同结构的性质,输入光波长为1400~1700 nm,覆盖1550 nm通信波长,仿真结果表明:边缘刻蚀方法具有更高的辐射率、更低的反射率,并且可以控制辐射光场的强度分布;中间刻蚀方法波导中的反射能量更强且线宽更窄。2种刻蚀方法下,光栅尺寸越大则辐射率越高;当光栅尺寸固定,波导宽度越大则边缘刻蚀的辐射率越低。波导光栅的部分刻蚀方法可以用于集成光路的设计优化。In order to study the influence of partial etching gratings on the diffracted beam of waveguide gratings and improve the degree of freedom of integrated photonics design,the different structural properties of waveguide partially etched gratings at the edge or middle were analyzed by finite time domain difference method simulation.The input light wavelength is in the range of 1400~1700 nm,covering 1550 nm communication wavelength.The simulation results show that the edge etching method has higher radiation efficiency,lower reflection efficiency,and can control the intensity distribution of the radiated light field.The reflected energy in the intermediate etch method waveguide is stronger and the linewidth is narrower.By using the two etching methods,the larger the grating size,the higher the radiation efficiency.When the grating size is fixed,the larger the waveguide width,the lower the radiation efficiency of edge etching.The partial etching method of waveguide gratings can be used to optimize the design of the integrated optical path.

关 键 词：绝缘体上硅 光栅 波导 集成光学 

分 类 号：TN252[电子电信—物理电子学]