基于Si纳米膜的差分结构矢量水听器工艺研究  

Research on differential structure vector hydrophone technology based on Si nanofilm

作　　者：苗晋威 杨沙沙 齐秉楠 曹文萍 史一明 王任鑫[1,2] MIAO Jinwei;YANG Shasha;QI Bingnan;CAO Wenping;SHI Yiming;WANG Renxin(State Key Laboratory of Dynamic Testing Technology,North University of China,Taiyuan 030051,China;Science and Technology on Sonar Laboratory,Hangzhou 310000,China)

机构地区：[1]中北大学省部共建动态测试技术国家重点实验室,山西太原030051 [2]声纳技术重点实验室,浙江杭州310000

出　　处：《传感器与微系统》2024年第3期60-62,75,共4页Transducer and Microsystem Technologies

基　　金：国家自然科学基金资助项目(51875535,61927807)。

摘　　要：通过关键工艺步骤,将硅(Si)纳米膜制备在差分结构水听器上作为压敏电阻,利用Si纳米膜的巨压阻效应来提高水听器的灵敏度;利用深Si刻蚀,将Si柱与芯片一体化,减少了差分结构的对准误差,同时抑制海洋洋流带来的振动干扰。设计了相对应的光刻掩模版和整套工艺流程,通过MEMS工艺,成功加工出Si纳米膜作为压敏电阻,实现矢量水听器芯片与Si柱集成化。对制备好的芯片进行观测与测试,使用激光共聚焦显微镜和扫描电子显微镜(SEM)设备观察芯片形貌良好,尺寸与设计基本一致;通过半导体分析仪测量得到压敏电阻器的阻值为15.3×10^(4)Ω,线性度良好,符合矢量水听器功能需求。Through critical process steps,Si nano membrane is prepared on difference structure hydrophone as varistor,giant piezoresistive effect of silicon nano film is used to improve the sensitivity of hydrophone.Deep silicon etching is used to integrate the silicon column and the chip,which reduces the alignment error of the differential structure and inhibits the vibration interference caused by ocean current.The corresponding photolithography mask and the whole process flow are designed.Through MEMS process,silicon nano film is successfully processed as the varistor,and the integration of vector hydrophone chip and silicon column is realized.The prepared chip is observed and tested.The chip morphology is observed to be good by confocal laser microscope and scanning electron microscope(SEM),and the size is basically consistent with the design.The resistance value of the varistor measured by the semiconductor analyzer is 15.3×10^(4)Ω,which has good linearity and meets the functional requirements of the vector hydrophone.

关 键 词：矢量水听器 抑制振动干扰 硅纳米膜 压敏电阻器 微电子机械系统 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置]