基于磁控溅射制备的YIG薄膜结构与磁性能  

Structure and magnetic properties of YIG thin film prepared by magnetron sputtering

作　　者：肖杨 卢志红[1] 张振华 赵新[1] 冯金地 XIAO Yang;LU Zhihong;ZHANG Zhenhua;ZHAO Xin;FENG Jindi(Faculty of Materials Science,Wuhan University of Science and Technology,Wuhan 430081,China)

机构地区：[1]武汉科技大学材料学部,湖北武汉430081

出　　处：《武汉科技大学学报》2024年第2期101-106,共6页Journal of Wuhan University of Science and Technology

基　　金：国家自然科学基金项目(91963207).

摘　　要：使用射频磁控溅射在衬底上沉积了纳米级YIG薄膜,借助X射线衍射仪、振动样品磁强计、铁磁共振等研究了溅射气压、溅射功率和退火温度对于所制薄膜结构与磁性能的影响,并基于唯象方程拟合出薄膜样品的Gilbert阻尼系数。Nanoscale YIG thin film was deposited on substrates by radio frequency magnetron sputtering technique.The effects of sputtering Ar pressure,sputtering power and annealing temperature on the structure and magnetic properties of the prepared YIG film were studied by means of X-ray diffractometer,vibrating sample magnetometer,ferromagnetic resonance,and the Gilbert damping coefficients of film samples were fitted via phenomenological equation.

关 键 词：YIG薄膜 磁控溅射 晶体结构 磁性 Gilbert阻尼 铁磁共振 

分 类 号：O469[理学—凝聚态物理] O482[理学—电子物理学]