不同调制周期TiAlN/VN多层膜的微观结构、力学和摩擦性能研究  

Microstructure,Mechanical and Friction Properties of TiAlN/VN Multilayer Films with Different Modulation Periods

作　　者：陆昆[1] 叶青青[1] 黄冠楠 郑怡 李友余[1] LU Kun;YE Qingqing;HUANG Guannan;ZHENG Yi;LI Youyu(Chuzhou City Vocational College,Chuzhou 239000,Anhui,China)

机构地区：[1]滁州城市职业学院,安徽滁州239000

出　　处：《山西师范大学学报（自然科学版）》2024年第1期59-63,共5页Journal of Shanxi Normal University(Natural Science Edition)

基　　金：安徽省教育厅自然科学重点项目(KJ2020A1004);安徽省2022年高校优秀青年骨干教师国内访学研修项目(gxgnfx2022159);安徽省2022年高校青年人才支持项目(gxyg2022233)。

摘　　要：为了研究调制周期对TiAlN/VN纳米结构多层膜结构和性能的影响,采用射频磁控溅射的方法,制备一系列不同调制周期对TiAlN/VN纳米结构多层膜.分别利用X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)、纳米压痕仪和摩擦磨损试验机对薄膜的相结构、截面形貌、硬度和摩擦学性能进行表征.研究结果表明:TiAlN/VN多层膜始终沿(111)面择优生长.随着调制周期的增加,多层膜的硬度表现为先增加后减小,调制周期6 nm时,多层膜硬度最高,为33.12 GPa,分析认为晶格错配引发的交变应力场是多层膜出现“超硬效应”的原因.室温条件下调制周期6 nm时多层膜平均摩擦系数最小,为0.3628;高温635℃时调制周期8 nm对应的多层膜平均摩擦系数最小,为0.2485.In order to study the effect of modulation period on the structure and properties of TiAlN/VN nanostructured multilayer films,a series of TiAlN/VN nanostructured multilayer films with different modulation periods were prepared by RF magnetron sputtering.The phase structure,cross-sectional morphology,hardness and tribological properties of the films were characterized by X-ray diffraction(XRD),field emission scanning electron microscopy(SEM),nanoindentation and friction and wear tester,respectively.The results show that TiAlN/VN multilayers always preferentially grow along(111)plane.With the increase of the modulation period,the hardness of the multilayer film increases first and then decreases.When the modulation period is 6 nm,the hardness of the multilayer film is the highest,which is 33.12 GPa.is considered that the alternating stress field caused by lattice mismatch is the reason for the“superhard effect”of the multilayer film.At room temperature,the average friction coefficient of the multilayer film is the smallest when the modulation period is 6 nm,which is 0.3628.At 635℃,the average friction coefficient of the multilayer film corresponding to the modulation period of 8 nm is the smallest,which is 0.2485.

关 键 词：磁控溅射 TiAlN/VN多层膜 硬度 摩擦性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理]