纳米压印技术在太阳能电池中应用的研究进展  

Research Progress of Nanoimprint Lithography Applied in Solar Cells

作　　者：李芳 张静 刘彦伯 Li Fang;Zhang Jing;Liu Yanbo(Shanghai Nanotechnology Promotion Center,Shanghai 200237,China)

机构地区：[1]上海市纳米科技与产业发展促进中心,上海200237

出　　处：《微纳电子技术》2024年第4期49-62,共14页Micronanoelectronic Technology

基　　金：上海科学院关键共性技术攻关计划项目(SKY202204)。

摘　　要：对纳米压印技术原理、分类和不同领域的应用进行了简单阐述。总结了纳米压印技术在不同类型的太阳能电池,如晶硅太阳能电池、薄膜太阳能电池、聚合物太阳能电池及其他新型太阳能电池中的应用,并重点阐述了纳米压印技术在制备太阳能电池减反膜、图案化衬底、图案化活性层和图案化电极等有效减少太阳能电池表面太阳光反射和大大提高太阳能电池光电转换效率方面的研究进展。最后,针对纳米压印技术在产业化中所面临的困难进行了分析和总结,并提出了纳米压印技术在太阳能电池领域未来的研究重点和发展方向。The principle,classification and application of nanoimprint lithography in different fields are briefly explained.The applications of nanoimprint lithography are summarized in different types of solar cells,such as crystalline silicon solar cell,thin film solar cell,polymer solar cell and other new solar cells.The research progresses of nanoimprint lithography are emphasized in the preparation of antireflection film,patterned substrate,patterned active layer,patterned electrode and so on,which can effectively reduce the surface light reflection of solar cells and greatly improve the photoelectric conversion efficiency of batteries.Finally,the difficulties faced by nanoimprint lithography in industrialization are analyzed and summarized,and the future research focus and development direction of nanoimprint lithography in the field of solar cells are put forward.

关 键 词：纳米压印 太阳能电池 减反 图案化 光电转换效率 

分 类 号：TN305.7[电子电信—物理电子学] TM914.4[电气工程—电力电子与电力传动]