等离激元隧道结(特邀)  

Plasmonic Tunnel Junctions(Invited)

作　　者：冯源佳 郑钧升 杨若雪 王攀[1] Feng Yuanjia;Zheng Junsheng;Yang Ruoxue;Wang Pan(State Key Laboratory of Extreme Photonics and Instrumentation,College of Optical Science and Engineering,Zhejiang University,Hangzhou 310027,Zhejiang,China)

机构地区：[1]浙江大学光电科学与工程学院极端光学技术与仪器全国重点实验室,浙江杭州310027

出　　处：《激光与光电子学进展》2024年第3期240-247,共8页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(12004333,62075195,92250305)。

摘　　要：等离激元隧道结是可以同时支持表面等离激元响应与电子隧穿效应的具有纳米尺度介质间隙的金属-绝缘体-金属结构。隧道结中电子、等离激元和光子等受到极强的约束并发生丰富的相互作用,这为在纳米尺度上研究和操控电子、光子,以及发展新一代纳米光电子器件提供了一个新的平台。本文综述了等离激元隧道结在等离激元激发/发光和等离激元/光子-电子转换中的应用。Plasmonic tunnel junctions are metal-insulator-metal structures with a nanoscale dielectric gap that can simultaneously support surface plasmons and electron tunneling.The extremely strong confinements and interactions of electrons,plasmons,and photons in the junctions provide a novel platform,merging electronics and photonics for studying and manipulating electrons and photons at the nanoscale.In this review,the recent progress in the field of plasmonic tunnel junctions is overviewed as concerns their applications in plasmon/light generation and plasmon/light-electron conversion.

关 键 词：表面等离激元 隧道结 电子隧穿 等离激元激发 光电转换 

分 类 号：O482[理学—固体物理]