Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification  

作　　者：Berke Erbas Ana Conde-Rubio Xia Liu Joffrey Pernollet Zhenyu Wang Arnaud Bertsch Marcos Penedo Georg Fantner Mitali Banerjee Andras Kis Giovanni Boero Juergen Brugger 

机构地区：[1]Microsystems Laboratory,École Polytechnique Fédérale de Lausanne(EPFL),Lausanne 1015,Switzerland [2]Center of MicroNanoTechnology(CMi),EPFL,Lausanne 1015,Switzerland [3]Laboratory of Nanoscale Electronics and Structures,École Polytechnique Fédérale de Lausanne(EPFL),Lausanne 1015,Switzerland [4]Laboratory for Bio-and Nano-Instrumentation,École Polytechnique Fédérale de Lausanne(EPFL),Lausanne 1015,Switzerland [5]Laboratory of Quantum Physics,Topology and Correlations,École Polytechnique Fédérale de Lausanne(EPFL),Lausanne 1015,Switzerland [6]Present address:Institute of Materials Science of Barcelona ICMAB-CSIC,Campus UAB,Bellaterra 08193,Spain [7]Present address:School of Integrated Circuits and Electronics,MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices,Beijing Institute of Technology,Beijing 100081,China

出　　处：《Microsystems & Nanoengineering》2024年第1期335-344,共10页微系统与纳米工程（英文）

基　　金：funding from the European Research Council(ERC)under the European Union’s Horizon 2020 research and innovation program(Project MEMS4.0,ERC-2016-ADG,grant agreement No.742685);the EU’s H2020 framework program for research and innovation under grant agreement n.101007417,NFFA-Europe Pilot Project.M.B.acknowledges the support of SNSF Eccellenza grant No.PCEGP2_194528;support from the QuantERA II Programme that has received funding from the European Union’s Horizon 2020 research and innovation program under Grant Agreement No 101017733;G.F.and M.P.received funding through the European research council H2020-UE Framework Programme for Research&Innovation(2014-2020);ERC-2017-CoG;InCell;Project number 773091,and the Swiss National Science Foundation through grant 200021_182562.

摘　　要：Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics.Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm,but its maximum depth in polymers is limited.Here,we present an innovative combination of nanowriting in thermal resist and plasma dry etching with substrate cooling,which achieves up to 10-fold amplification of polymer nanopatterns into SiO_(2) without proportionally increasing surface roughness.Sinusoidal nanopatterns in SiO_(2) with 400 nm pitch and 150 nm depth are fabricated free of shape distortion after dry etching.To exemplify the possible applications of the proposed method,grayscale dielectric nanostructures are used for scalable manufacturing through nanoimprint lithography and for strain nanoengineering of 2D materials.Such a method for aspect ratio amplification and smooth grayscale nanopatterning has the potential to find application in the fabrication of photonic and nanoelectronic devices.

关 键 词：LITHOGRAPHY THERMAL pattern 

分 类 号：TB383[一般工业技术—材料科学与工程]