大规模铌酸锂光子集成系统的超快激光光刻研究进展  

Progress on ultrafast laser lithography of large-scale lithium niobate integrated photonics

作　　者：黄金鑫 陈锦明 刘招祥 宋吕斌 王冠华 孙超[2,3] 伍荣波 林锦添[1] 方致伟 张海粟 王哲[2] 齐家 汪旻 程亚[1,2,3,4] Jinxin Huang;Jinming Chen;Zhaoxiang Liu;Lvbin Song;Guanhua Wang;Chao Sun;Rongbo Wu;Jintian Lin;Zhiwei Fang;Haisu Zhang;Zhe Wang;Jia Qi;Min Wang;Ya Cheng(State Key Laboratory of High Field Laser Physics,Shanghai Institute of Optics and Fine Mechanics(SIOM),Chinese Academy of Sciences(CAS),Shanghai 201800,China;The Extreme Optoelectromechanics Laboratory(XXL),School of Physics and Electronic Science,East China Normal University,Shanghai 200241,China;State Key Laboratory of Precision Spectroscopy,East China Normal University,Shanghai 200062,China;School of Physical Science and Technology,ShanghaiTech University,Shanghai 200135,China)

机构地区：[1]中国科学院上海光学精密机械研究所强场激光物理国家重点实验室,上海201800 [2]华东师范大学物理与电子科学学院极端光机电实验室,上海200241 [3]华东师范大学精密光谱国家重点实验室,上海200062 [4]上海科技大学物质科学与技术学院,上海200135

出　　处：《科学通报》2024年第12期1528-1539,共12页Chinese Science Bulletin

基　　金：国家重点研发计划(2019YFA0705000,2022YFA1404600,2022YFA1205100);国家自然科学基金(12192251,12104159,12004116,11933005,12134001,61991444,12174113,12274133,12204176,12274130);上海市“科技创新行动计划”集成电路科技支撑专项(21DZ1101500);上海市青年科技英才扬帆计划(21YF1410400)资助。

摘　　要：飞秒光刻辅助化学机械刻蚀技术(photolithography assisted chemo-mechanical etching,PLACE)实现了在薄膜铌酸锂(thin-film lithium niobate,TFLN)上高品质大规模光子集成电路(photonic integrated circuit,PIC)的制造,并推动了光子集成电路重大应用领域的持续发展,产生了一系列高性能PIC应用,诸如高Q微谐振器、低损耗波导、波导放大器、阵列波导光栅(arrayed waveguide grating,AWG)和电光(electro-optic,EO)可调谐/可编程光子器件等.针对PIC器件和光刻系统的大规模生产,本文介绍了一种超高速高分辨率激光光刻制造系统,采用高重复频率飞秒激光器和高速多边形激光扫描仪,可实现200 nm分辨率下4.8 cm2/h的光刻制造效率,并且展示了基于TFLN光子器件的晶圆级制造、晶圆级微电极结构等的应用.The combination of advanced functional materials with high optical performance and cutting-edge micro/nano fabrication technology has ushered in a new era for integrated photonics.Thin-film lithium niobate(TFLN)has emerged as a promising material platform for the next generation photonic integrated circuits(PICs),owing to its wide transparency window from UV to mid-IR,moderately high refractive index that enables dense photonic integration while maintaining a suitable mode-size in the single-mode lithium niobate(LN)ridge waveguide,and large electro-optic(EO)as well as nonlinear optical coefficients which are critical for high-speed EO tuning and high-efficiency wavelength conversion applications.Photolithography assisted chemo-mechanical etching(PLACE),a technique developed specifically for fabricating high quality(high-Q)large-scale PICs on TFLN,has enabled fabrication of a series of building blocks of PICs ranging from high-Q micro-resonators and low-loss waveguides to waveguide amplifiers,arrayed waveguide grating(AWG)and electro optically tunable/programmable photonic circuits,showing high optical performance,such as,1.2×108-ultra-high-Q micro-resonator,0.025-dB/cm ultra-low-loss continuously tunable delay line,20-dB gain waveguide amplifier and 1.5-mW total power consumption matrix operation devices.Aiming at high-throughput manufacturing of the PIC devices and systems,we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition-rate femtosecond laser and a high-speed polygon laser scanner,achieving infinite field of vision(IFOV)processing,by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm.Using the high-speed femtosecond laser lithography system,we successfully fabricate photonic structures of large footprints with reasonable propagation loss.By combining the previous femtosecond scan scheme for smoothing mask edges with a high-speed polygon scan scheme for patterning the waveguide groove p

关 键 词：薄膜铌酸锂 光子集成电路 光刻 飞秒激光微加工 

分 类 号：TN405[电子电信—微电子学与固体电子学]