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作 者:Haonan Si Xuan Zhao Qingliang Liao Yue Zhang
机构地区:[1]Academy for Advanced Interdisciplinary Science and Technology,Beijing Advanced Innovation Center for Materials Genome Engineering,University of Science and Technology Beijing,Beijing 100083,China [2]Key Laboratory of Advanced Materials and Devices for Post-Moore Chips,Ministry of Education,Beijing Key Laboratory for Advanced Energy Materials and Technologies,School of Materials Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China
出 处:《International Journal of Minerals,Metallurgy and Materials》2024年第5期855-861,共7页矿物冶金与材料学报(英文版)
基 金:financially supported by the National Key Research and Development Program of China(No.2018YFA0703500);the National Natural Science Foundation of China(Nos.52232006,52188101,52102153,52072029,51991340,and 51991342);the Overseas Expertise Introduction Projects for Discipline Innovation,China(No.B14003);the Fundamental Research Funds for the Central Universities,China(Nos.FRF-TP-18-001C1 and 06500160);the Interdisciplinary Research Project for Young Teachers of USTB(Fundamental Research Funds for the Central Universities)(Nos.FRF-IDRY-21-019 and FRFIDRY-21-014);the State Key Lab for Advanced Metals a nd Materials,China(No.2023-Z01)。
摘 要:Lithography is a pivotal micro/nanomanufacturing technique,facilitating performance enhancements in an extensive array of devices,encompassing sensors,transistors,and photovoltaic devices.The key to creating highly precise,multiscale-distributed patterned structures is the precise control of the lithography process.Herein,high-quality patterned ZnO nanostructures are constructed by systematically tuning the exposure and development times during lithography.By optimizing these parameters,ZnO nanorod arrays with line/hole arrangements are successfully prepared.Patterned ZnO nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure,enlarged surface area,and improved light capture ability,which achieve highly efficient energy conversion in perovskite solar cells.The lithography process management for these patterned ZnO nanostructures provides important guidance for the design and construction of complex nanostructures and devices with excellent performance.
关 键 词:LITHOGRAPHY patterned ZnO nanorod arrays light absorption perovskite solar cell
分 类 号:TQ132.41[化学工程—无机化工] TB383.1[一般工业技术—材料科学与工程]
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