化学气相沉积HfO_(2)涂层的制备及性能  

Preparation and properties of HfO_(2) coatings by chemical vapor deposition

作　　者：何锐朋 朱利安[1] 王震 叶益聪[1] 李顺[1] 唐宇[1] 白书欣[1] HE Ruipeng;ZHU Li’an;WANG Zhen;YE Yicong;LI Shun;TANG Yu;BAI Shuxin(College of Aerospace Science and Engineering,National University of Defense Technology,Changsha 410073,China)

机构地区：[1]国防科技大学空天科学学院,长沙410073

出　　处：《材料工程》2024年第5期67-75,共9页Journal of Materials Engineering

基　　金：国家自然科学基金(52071333);湖南省创新型省份建设专项(湖湘青年英才)(2020RC3034)。

摘　　要：采用化学气相沉积(CVD)法在难熔金属Mo表面制备厚约8μm的HfO_(2)涂层。通过HSC Chemistry软件从热力学角度探究CVD HfO_(2)的反应过程,分析HfO_(2)涂层的微观形貌、择优生长情况和纳米力学性能,测试涂层与基体的结合力及抗热震性。结果表明:HfO_(2)涂层与基体结合良好,在经历25~2000℃,100次循环热震后涂层表面未出现宏观剥落;划痕法测定的涂层附着力约23 N;在2.5~5μm波段,涂层表面平均发射率为0.48,将Mo在该波段的平均发射率提高了近5倍。HfO_(2) coatings with a thickness of approximately 8 μm were prepared on the refractory metals Mo surface by using chemical vapor deposition(CVD),and the reaction process of CVD HfO_(2) was thermodynamically analyzed by HSC Chemistry. The microscopic morphology,self-oriented growth and nanomechanical properties of HfO_(2) coatings were analyzed,and the bonding force of the coatings with the substrate and thermal shock resistance were tested. The results show that the HfO_(2) coating is well bonded to the substrate,and no macroscopic flaking occurs on the surface of the coating after 100 cycles of thermal shock from 25 ℃ to 2000 ℃;the adhesion of the coating is about 23 N as determined by the scratch test;the average emissivity of the surface of the coating is 0. 48 in the band of 2. 5-5 μm,which improves the average emissivity of Mo in the band by nearly 5 times.

关 键 词：化学气相沉积 氧化铪涂层 热力学计算 发射率 抗热震性 

分 类 号：TG146[一般工业技术—材料科学与工程] TB333[金属学及工艺—金属材料]