Erratum to:Superlubricity of epitaxial monolayer WS_(2)on graphene  

作　　者：Holger Büch Antonio Rossi Stiven Forti Domenica Convertino Valentina Tozzini Camilla Coletti 

机构地区：[1]Center for Nanotechnology Innovation@NEST,Istituto Italiano di Tecnologia,Piazza S.Silvestro 12,56127 Pisa,Italy [2]NEST,Istituto Nanoscienze–CNR and Scuola Normale Superiore,Piazza San Silvestro 12,56127 Pisa,Italy [3]Graphene Labs,Istituto Italiano di Tecnologia,Via Morego 30,16163 Genova,Italy

出　　处：《Nano Research》2024年第6期5754-5754,共1页纳米研究（英文版）

摘　　要：The article"Superlubricity of epitaxial monolayer WS2 on graphene",written by Holger Büch,Antonio Rossi,Stiven Forti,Domenica Convertino,Valentina Tozzini,and Camilla Coletti,was originally published electronically on the publisher’s internet portal(currently SpringerLink)on June 18th 2018 without open access.With the author(s)’decision to opt for Open Choice the copyright of the article changed in August 2018 to©The Author(s)2018 and the article is forthwith distributed under the terms of the Creative Commons Attribution 4.0 International License(http://creativecommons.org/licenses/by/4.0/),which permits use,duplication,adaptation,distribution and reproduction in any medium or format,as long as you give appropriate credit to the original author(s)and the source,provide a link to the Creative Commons license and indicate if changes were made.

关 键 词：MONOLAYER EPITAXIAL LICENSE 

分 类 号：O61[理学—无机化学]