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作 者:蔡元浩 付秀华[1,2] 林兆文 王奔 黄卓彬 潘永刚[2,3] 董所涛 付广元 Cai Yuanhao;Fu Xiuhua;Lin Zhaowen;Wang Ben;Huang Zhuobin;Pan Yonggang;Dong Suotao;Fu Guangyuan(School of Optoelectronic Engineering,Changchun University of Science and Technology,Changchun 130022,Jilin,China;Zhongshan Institute of Changchun University of Science and Technology,Zhongshan 528437,Guangdong,China;Zhongshan Gilion Optoelectronics Technology Co.,Ltd.,Zhongshan 528437,Guangdong,China)
机构地区:[1]长春理工大学光电工程学院,吉林长春130022 [2]长春理工大学中山研究院,广东中山528437 [3]中山吉联光电科技有限公司,广东中山528437
出 处:《光学学报》2024年第7期252-260,共9页Acta Optica Sinica
基 金:国家自然科学基金(11973040);中山市社会公益科技研究项目(2022B2005);长春市激光智造与检测装备科技创新中心长科技合项目(2014219)。
摘 要:为抑制非相干光产生的干扰,提高紫外单色仪的分辨率,本文选择Al2O3、AlF3分别作为高、低折射率材料,在熔融石英基底上设计并制备了深紫外全介质高陡度滤光膜。通过优化沉积工艺及膜层应力分析方法,解决了薄膜应力过大所导致的膜裂问题;并对实验结果进行反演分析,通过优化监控方法提高了膜厚控制精度。制备的深紫外高陡度滤光膜在232~400 nm平均透过率为97.67%,在115~228 nm平均透过率为0.61%,过渡区陡度为3.6 nm,满足紫外单色仪的使用需求。Objective With the rapid development of ultraviolet optics and ultraviolet technology,ultraviolet monochromator as an important tool in the development of ultraviolet technology provides strong support for related technological innovation.As an important optical component in the ultraviolet monochromator,the ultraviolet filter performance seriously affects the test accuracy of the monochromator,and its optical performance mainly includes transmittance,cut-off depth,and steepness of the transition zone,among which the influence of steepness is particularly important.In recent years,in-depth research has been carried out on the preparation of high-performance ultraviolet filter films at home and abroad,most of which focus on center transmittance,cut-off depth,and cut-off band width.Meanwhile,although the optical performance has been improved to a certain extent,in the transition zone there are still some stray rays that have not been effectively filtered out.To this end,based on the utilization requirements of the ultraviolet monochromator,a deep ultraviolet highsteepness filter film is developed to filter the interference of incoherent light and improve the measurement accuracy of the monochromator.Methods By analyzing material properties and studying the thin film design theory,Al2O3 and AlF3 are selected as high and low refractive index materials respectively,and a vacuum ultraviolet wide cut-off,deep ultraviolet to visible high transmission filter film is designed on the fused silica substrate by double-sided split design method.During thin film preparation,the control variable method is adopted to optimize the preparation and thin film stress analysis,and the optimal deposition process parameters are selected,which solves the problem of thin film cracking caused by excessive stress of the prepared high-steep filter film.Additionally,the monitoring error of film thickness is inverted and analyzed via repeated experiments,and the proportion coefficient of film thickness is corrected to realize the accurate monit
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