超高真空光学显微系统的设计  

Design of ultrahigh vacuum optical microscopy system

作　　者：江虹 JIANG Hong(Xiamen Civil-Military Integrated And Synergetic Innovation Institute,Xiamen 361000,China)

机构地区：[1]厦门市先进光电技术工程研究中心,福建厦门361000

出　　处：《光学技术》2024年第3期374-378,共5页Optical Technique

摘　　要：电子显微镜等仪器是研究材料微观形貌的重要工具,常工作在真空环境。为了快速瞄准电子显微镜测量的目标区域,有必要引入一种辅助光学显微镜,直接提供样品区域的空间图像。文章介绍了一种用于超高真空环境直接观测的超高真空光学显微系统的设计,光学显微物镜具有21.8mm的长工作距离,实现了40倍的光学放大和实测横向1.28μm,纵向1.59μm的高分辨率成像,足以辅助多种电子显微类仪器装置搜索目标区域。该物镜分为两个镜组,其中前镜组在超高真空内,后镜组在超高真空外,前后镜组距离680mm,并通过真空六维调整架控制整个显微物镜对目标样品进行扫描,对改进电子显微镜的探测效率起到非常明显的效果。此外,该显微镜也可应用于真空机械剥离等其他需要光学辅助的系统。Electron microscope and other instruments are important tools to study the microstructure of materials,often working in a vacuum environment.In order to quickly target the target area measured by the electron microscope,it is necessary to introduce an auxiliary optical microscope to provide a spatial image of the sample area directly.This paper introduces the design of an ultra-high vacuum optical microscope system for direct observation in ultra-high vacuum environment.The optical microscope objective lens has a long working distance of 21.8mm,achieving 40X optical magnification and transverse 1.28μm,longitudinal 1.59μm actually measured high resolution imaging effect,which can assist many kinds of electron microscopy instruments to search the target area.The objective is divided into two groups,the front group is in ultra-high vacuum,the rear group is outside ultra-high vacuum.The distance between two groups is 68mm.And the whole microscopic objective is controlled by the vacuum six-dimensional adjustment frame to scan the target sample,which has a very obvious effect on improving the detection efficiency of the electron microscope.In addition,the microscope can also be used in vacuum mechanical stripping and other systems requiring optical assistance.

关 键 词：几何光学 光学显微物镜 超高真空 超长镜筒 反向光学设计 

分 类 号：TP394.1[自动化与计算机技术—计算机应用技术] TH691.9[自动化与计算机技术—计算机科学与技术]