基于大高宽比CD-AFM探针的设计与制备  

Design and Manufacture of CD-AFM Probe Based on High-Aspect-Ratio Structure

作　　者：贺龙 李淑娴[1] 苗斌[2,3] 李加东 陈颖[4] 苗小浦 吴森[4] HE Long;LI Shuxian;MIAO Bin;LI Jiadong;CHEN Ying;MIAO Xiaopu;WU Sen(College of Mechanical Engineering,Dalian University,Dalian 116622,China;Suzhou Institute of Nano-Tech and Nano-Bionics Lightweight Laboratory,Chinese Academy of Sciences,Suzhou 215123,China;Key Laboratory of Multifunctional Nanomaterials and Smart Systems,Chinese Academy of Sciences,Suzhou 215123,China;School of precision instrument and opto-electronics engineering,Tianjin University,Tianjin 300072,China)

机构地区：[1]大连大学机械工程学院,辽宁大连116622 [2]中国科学院苏州纳米技术与纳米仿生研究所轻量化实验室,江苏苏州215123 [3]中国科学院多功能材料与轻巧系统重点实验室,江苏苏州215123 [4]天津大学精密仪器与光电子工程学院,天津300072

出　　处：《压电与声光》2024年第3期409-413,428,共6页Piezoelectrics & Acoustooptics

基　　金：国家重点研发计划(2021YFB3201600);国家自然科学基金(面上项目)(62074159);苏州市科技计划项目(SSD2023001)

摘　　要：针对传统原子力显微镜(AFM)探针和关键尺寸原子力显微镜(CD-AFM)探针受限于针尖有效扫描高度较低,无法对深沟槽和大悬垂侧壁结构进行精准扫描成像的问题,提出了一种大高宽比针尖结构的新型CDAFM探针设计与制备方案。开发的新型CD-AFM探针针尖有效高度为5.1~5.8μm,高宽比达到14,相较于传统硅基CD-AFM探针,其有效高度提升了约4倍。利用开发的探针完成了标称深度为2.3μm、深宽比为4.6的深沟槽样品测试。The conventional atomic force microscope(AFM)and critical-dimension atomic force microscope(CD-AFM)probes are limited by the low effective scanning height of the tip,which prevents the accurate scanning and imaging of deep trenches and large overhanging sidewall structures.Hence,a design and preparation scheme for a new CD-AFM probe with a large-aspect-ratio tip structure is proposed herein.The developed CD-AFM probe has an effective tip height of 5.1-5.8μm and an aspect ratio of 14.The improved effective height is approximately four times that of conventional silicon-based CD-AFM probes.Finally,the developed probe isevaluated using a deeptrench sample with a nominal depth of 2.3μm and an aspect ratio of 4.6.

关 键 词：关键尺寸原子力显微镜探针 深沟槽 大悬垂侧壁 大高宽比 有效高度 

分 类 号：TN305[电子电信—物理电子学]