Etching of quartz crystals in liquid phase environment:A review  

作　　者：Yide Dong Yike Zhou Haizhou Huang Bosong Zhang Xihan Li Kaiwen Chen Litao Sun Guangbin Dou 

机构地区：[1]SEU-FEI Nano-Pico Center,Key Laboratory of MEMS of Ministry of Education,Southeast University,Nanjing 210096,People’s Republic of China [2]Nanjing Jingxin Optoelectronics Research Institute,Nanjing 210096,People’s Republic of China

出　　处：《Nanotechnology and Precision Engineering》2024年第2期87-109,共23页纳米技术与精密工程（英文）

基　　金：supported by the Natural Science Foundation of China (Grant No.12234005);the major research and development program of Jiangsu Province (Grant Nos.BE2021007-2 and BK20222007)。

摘　　要：Quartz crystals are the most widely used material in resonant sensors,owing to their excellent piezoelectric and mechanical properties.With the development of portable and wearable devices,higher processing efficiency and geometrical precision are required.Wet etching has been proven to be the most efficient etching method for large-scale production of quartz devices,and many wet etching approaches have been developed over the years.However,until now,there has been no systematic review of quartz crystal etching in liquid phase environments.Therefore,this article provides a comprehensive review of the development of wet etching processes and the achievements of the latest research in thisfield,covering conventional wet etching,additive etching,laser-induced backside wet etching,electrochemical etching,and electrochemical discharge machining.For each technique,a brief overview of its characteristics is provided,associated problems are described,and possible solutions are discussed.This review should provide an essential reference and guidance for the future development of processing strategies for the manufacture of quartz crystal devices.

关 键 词：Quartz crystal Materials processing Wet etching MICROFABRICATION Quartz MEMS 

分 类 号：O786[理学—晶体学]