光刻机光源系统中的波长控制与稳定性改进  

Analysis of Wavelength Control and Stability Improvement in Machine Light Source Systems

作　　者：董佳 余洋 DONG Jia;YU Yang(Shanghai Integrated Circuit Equipment and Materials Industry Innovation Centre Co.,Ltd,Shanghai 201800,China.)

机构地区：[1]上海集成电路装备材料产业创新中心有限公司,上海201800

出　　处：《集成电路应用》2024年第5期70-71,共2页Application of IC

摘　　要：阐述为改进机台光源系统中的波长控制与稳定性,通过完善现有光源系统,优化波长调节和稳定技术,并进行实验验证,探讨可行的解决方案。该方案包括理论分析、光学设计和波长调节实验。This paper describes the improvement of wavelength control and stability in the machine light source system.By improving the existing light source system,optimizing wavelength adjustment and stability technology,and conducting experimental verification,feasible solutions are explored.This plan includes theoretical analysis,optical design,and wavelength adjustment experiments.

关 键 词：集成电路 光刻机台 光源系统 波长控制 

分 类 号：TN405[电子电信—微电子学与固体电子学]