基于CMP运行过程数据可视化分析系统的研究与实现  

Research and Application of Visualization Analysis System Based on CMP Process Data

作　　者：贾若雨 白琨 李嘉浪 JIA Ruoyu;BAI Kun;LI Jialang(Beijing GEGV Technology Co.,Ltd.,Beijing 100176,China)

机构地区：[1]北京晶亦精微科技股份有限公司,北京100176

出　　处：《电子工业专用设备》2024年第4期24-29,共6页Equipment for Electronic Products Manufacturing

摘　　要：Chemical Mechanical Polishing(CMP)工艺过程中产生大量运行数据,存在数据量庞大、数据种类复杂多样等特点。而且现有数据分析方法单一,造成数据资源浪费,限制研究人员对运行情况的掌握和优化。针对这些情况提出一种数据可视化分析系统,对运行数据进行实时存储,提出4种可视化视图,针对不同数据分析需求,通过对比分析、关联分析和用户交互,可有效帮助研究人员探索工艺过程中影响工艺效果的原因,优化工艺参数,提升生产效率。During Chemical Mechanical Polishing(CMP)process generates mass data.The characteristics of data include the large amount,complex and diverse data types.The existing data analysis methods are manipulated,resulting in waste of data resources,and limit the researchers to grasp and optimize the operation.In this paper,a data visual analysis system is proposed to store the operational data in real time,and four visual views are proposed aimed at different analysis requirements.Through comparative analysis,association analysis and user interaction,researchers can effectively explore the factors affecting the CMP process,optimize the process parameters,and improve production efficiency.

关 键 词：化学机械抛光 可视分析 用户交互 

分 类 号：TN305.2[电子电信—物理电子学]