电子束曝光机子系统光柱控制器设计  

Design of Beam Controller for Electron Beam Exposure Machine Subsystem

作　　者：何远湘 龙会跃 梁文彬 苏鑫 HE Yuanxiang;LONG Huiyue;LIANG Wenbin;SU Xin(The 48^(th)Research Institute of CETC,Changsha 410111,China)

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2024年第4期30-35,共6页Equipment for Electronic Products Manufacturing

摘　　要：为了提高电子束曝光机光柱控制器稳定性和控制精度,通过多年研究提出了一套功能较为完备的新型光柱控制的硬件设计方案,通过对电子束聚焦、对中、偏转、扫描曝光等参数精准控制,将图形发生器产生各项数字信号变换成对应的模拟量,稳定地控制电子束对承放在激光工作台上的掩模基片进行扫描曝光,从而达到高质量生产。In order to improve the stability and control accuracy of the electron beam exposure machine's light column controller,a relatively complete hardware design scheme is proposed for a new type of light column control through years of research.By precisely controlling parameters such as electron beam focusing,centering,deflection,and scanning exposure,the digital signals generated by the pattern generator are transformed into corresponding analog quantities,and the electron beam is stably controlled to scan and expose the mask substrate placed on the laser worktable,thereby achieving high-quality production.

关 键 词：电子束曝光机 光柱 聚焦 束闸 偏转 数模转换(DAC)转接 

分 类 号：TN305.7[电子电信—物理电子学]