自动测试技术在MEMS硅腔滤波器工艺中的应用  

Application of Automatic Testing Technology in MEMS Silicon Cavity Filter Process

作　　者：王晓倩 杨志[2] WANG Xiaoqian;YANG Zhi(Hebei Sinopack Electronic Technology Co.,Ltd,Shijiazhuang 050051,China;The 13th Research Institute of CETC,Shijiazhuang 050051,China)

机构地区：[1]河北中瓷电子科技股份有限公司,河北石家庄050051 [2]中国电子科技集团公司第十三研究所,河北石家庄050051

出　　处：《电子工业专用设备》2024年第4期54-57,共4页Equipment for Electronic Products Manufacturing

摘　　要：在微波通信系统中,滤波器作为通信系统中不可缺少的微波无源器件,其性能指标直接影响整个通信系统的性能。与传统滤波器相比,微机电系统(Micro-Electro-Mechanical System,MEMS)滤波器具有集成度高、小型化等优点,其中腔体结构在RF MEMS滤波器中有着广泛的应用。感应耦合等离子刻蚀是实现三维腔体结构的关键技术,其刻蚀均匀性直接影响腔体滤波器的性能指标。过程控制监控(Process Control Monitoring,PCM)是MEMS工艺控制中的重要监控手段,利用自动测试系统,论述了用于自动测试的PCM图形,通过数据处理得到硅腔深度分布图,并拟合出硅腔深度和中心频率对应关系,反应了当前刻蚀的工艺能力,为后续产品设计、提高刻蚀均匀性及优化版图设计提供了数据支撑。In microwave communication systems,filters are indispensable microwave passive components,the performance indicators of the filters directly affect the performance of the entire communication system.Compared with traditional filters,MEMS filters have advantages such as high integration and miniaturization.The cavity structure has a wide range of application in RF MEMS filters.Inductively coupled plasma etching is a key technology to realize 3D cavity structure,and its etching uniformity directly affects the performance of cavity filter.Process control monitoring(PCM)is an important monitoring method in MEMS process control.In this paper uses an automatic testing system to design PCM graphics for automatic testing.Through data processing,a silicon cavity depth map is obtained,and the corresponding relationship between silicon cavity depth and center frequency is fitted,reflecting the current process capability.This provides date support for subsequent product design,improving etching uniformity,and optimizing layout design.

关 键 词：滤波器 腔体深度 自动测试 过程控制监控 中心频率 

分 类 号：TN606[电子电信—电路与系统]