抛光工艺对平面与球面铆钉电触头接触电阻的影响  

Influence of Polishing Process on Contact Resistance of Electric Contacts of Flat And Spherical Rivets

作　　者：杨光 黄文明 叶俊凯 刘映飞 颜小芳 柏小平 YANG Guang;HUANG Wenming;YE Junkai;LIU Yingfei;YAN Xiaofang;BAI Xiaoping(Fuda Alloy Materials Co.,Ltd.,Wenzhou 325025,China)

机构地区：[1]浙江福达合金材料科技有限公司,浙江温州325025

出　　处：《电工材料》2024年第4期17-20,共4页Electrical Engineering Materials

摘　　要：研究了在两种抛光工艺下对平面、球面铆钉电触头接触电阻的影响。抛光工艺使用钢针磨和球磨两种工艺。结果表明:在同种铆钉规格下,球磨抛光工艺的粗糙度低于钢针抛光工艺的粗糙度,球磨抛光工艺的接触电阻低于钢针抛光工艺的接触电阻,且抛光工艺对平面铆钉电触头的接触电阻影响较大,这与抛光工艺对表面粗糙度的影响有关。The effects of two polishing processes on the contact resistance of electrical contacts of flat and spherical rivets were studied.The polishing process uses two processes of steel pin grinding and ball grinding.The research results show that under the same rivet specifications,the roughness of the ball grinding and polishing process is lower than that of the steel needle polishing process,and the contact resistance of the ball grinding and polishing process is lower than that of the steel needle polishing process.The polishing process has the greatest influence on the contact resistance of the flat rivet electrical contacts,which is related to the influence of the polishing process on the surface roughness.

关 键 词：电触头 抛光工艺 接触电阻 

分 类 号：TM504[电气工程—电器]