双光子光刻中感光材料的回顾与挑战(特邀)  

Review and Challenges of Photosensitive Materials in Two⁃Photon Lithography(Invited)

作　　者：董芸 何向明[1] 徐宏 Dong Yun;He Xiangming;Xu Hong(Institute of Nuclear and New Energy Technology,Tsinghua University,Beijing 100084,China)

机构地区：[1]清华大学核能与新能源技术研究院,北京100084

出　　处：《中国激光》2024年第12期254-277,共24页Chinese Journal of Lasers

基　　金：国家自然科学基金(52073161)。

摘　　要：双光子光刻是一种自上而下的微纳制造技术,具有超越衍射极限的空间分辨率,并且可通过激光直写构建三维立体结构,在微电子器件、微纳光学、生物医药、超材料等领域中都有着难以取代的应用价值。随着应用场景的扩展,双光子光刻胶的发展亟须从聚合物材料扩展到无机、金属等多元材料体系。然而,如何利用引发剂的双光子吸收效应实现新材料的高效光致溶解性变化,以及如何开发新型光刻材料体系以实现更高的空间分辨率、刻写速率,仍是双光子光刻材料领域所面临的挑战。将从双光子感光材料的角度,回顾自由基型、阳离子型等双光子引发剂的分子设计和光敏特性,以及聚合物光刻胶和无机-有机复合光刻胶构建三维结构的策略和材料特点。通过对双光子感光材料中的材料体系、反应机理和引发剂体系的综述,以期为未来双光子光刻材料的选择和设计提供参考。Significance Micro-or nano-scale materials often exhibit physical properties different from those of macroscopic materials,unlocking potential functional applications.The use of micro-and nanoscale structures and devices has become increasingly widespread in areas such as microelectronics,micro-optics,biomedicine,and metamaterials.Consequently,high-resolution and high-precision micro-and nanofabrication technologies must be developed to better understand material properties at the microscopic scale and facilitate the construction of functional devices.Current strategies for creating micro-and nanostructures in nanotechnology can be broadly categorized into bottom-up and topdown approaches.Bottom-up strategies include atomic layer deposition,sol-gel nanofabrication,molecular self-assembly,and physical/chemical vapor deposition.In contrast,top-down strategies include photolithography,electron beam lithography,twophoton lithography,nanoimprinting,laser sintering,and inkjet printing.Top-down strategies typically offer superior processing accuracy and resolution,enabling repeatable large-scale production.In top-down micro-and nanofabrication,techniques such as electron beam lithography,photolithography,and nanoimprinting,can perform micro-and nanofabrication;however,they often produce two-dimensional patterns in a single manufacturing step.The creation of three-dimensional structures requires multi-layer printing or the use of complex imprinting templates.Laser sintering and inkjet printing can process ceramic and metallic materials but cannot directly process bulk or solution materials.In contrast,twophoton lithography,with its unique two-photon absorption effect,offers high resolution and exceptional spatial selectivity,creating intricate three-dimensional structures within a photoresist film or solution.Nevertheless,the practical implementations of two-photon lithography encounter several challenges.First,femtosecond lasers are prohibitively expensive.Second,the spatial resolution and writing speed of two-photon li

关 键 词：双光子光刻 微纳制造 三维微结构 光刻胶 光敏剂 无机-有机杂化材料 

分 类 号：O437[机械工程—光学工程]