具有超衍射和多受体的新型纳秒激光直写研究进展(特邀)  

Progress in New-Type Nanosecond LDW with Super-Resolution and Multi-Acceptor Materials(Invited)

作　　者：王骏琦 陈胜垚 王树 马立俊 杜潇姗 王聪[4] 齐俊杰[1] 刘前 Wang Junqi;Chen Shengyao;Wang Shu;Ma Lijun;Du Xiaoshan;Wang Cong;Qi Junjie;Liu Qian(School of Materials Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China;CAS Center for Excellence in Nanoscience,National Center for Nanoscience and Technology,University of Chinese Academy of Sciences,Beijing 100190,China;The Key Laboratory of Weak Light Nonlinear Photonics,Ministry of Education,School of Physics and TEDA Institute of Applied Physics,Nankai University,Tianjin 300071,China;College of Mathematics and Physics,Beijing University of Chemical Technology,Beijing 100029,China)

机构地区：[1]北京科技大学材料科学与工程学院,北京100083 [2]中国科学院纳米卓越中心,国家纳米科学中心,中国科学院大学,北京100190 [3]南开大学物理科学学院,泰达应用物理研究院,弱光非线性光子学教育部重点实验室,天津300071 [4]北京化工大学理学院,北京100029

出　　处：《中国激光》2024年第12期292-308,共17页Chinese Journal of Lasers

基　　金：国家自然科学基金(51971070);国家重点研发计划(2016YFA0200403);欧盟第七框架计划(No.247644);中国科学院A类战略性先导科技专项(XDA 09020300)。

摘　　要：激光直写(LDW)是一种无掩模、高效且经济的微纳米加工手段,它广泛应用于微机电系统、光刻掩模版制作和微纳米加工等领域。随着纳米技术的迅猛发展,研究人员对LDW系统的多受体和高加工分辨率的需求日益增加。为了满足上述需求和探索新的微纳米加工技术,开发新型激光直写系统已成为必然。新型纳秒LDW系统是在激光与物质的非线性相互作用的原理下工作的,不仅突破了传统LDW只能使用有机光刻胶作为受体材料的限制,同时实现了超越衍射极限的加工。已经取得的进展表明了新型纳秒激光直写在多种材料刻写及纳米结构加工方面的优势和巨大发展潜力。本文将从原理、设备、技术方法与新应用等方面对新型纳秒激光直写进行评述和讨论。Significance The realization of nanotechnology depends on nanoscale structures and devices that are based on micro-nano processing technology.Many types of micro-nano fabrication technologies exist,including photolithography,electron beam lithography,and focused ion beams.Since their advent,lasers have been used in various fields such as laser drilling,welding,cutting,engraving,and heat treatment.In recent years,the development of laser fabrication has become an important part of the field of micro-nano fabrication.As a cost-effective lithography technology,laser direct writing(LDW)can be used to achieve maskless rapid writing under nonvacuum conditions using a continuous or pulsed laser,which greatly reduces the device manufacturing cost and is a competitive processing technology.Compared with common photolithography,focused ion beams,and electron beam lithography,LDW technology has the advantages of using large-area,cost-effective,simple,and efficient processes as well as environmentally friendly fabrication.Since Gale et al.successfully fabricated microlens arrays using LDW in 1983,LDW has attracted increasing attention.LDW systems are widely used to fabricate various microstructures and devices.However,with technological developments,the degree of miniaturized integration of devices is increasing,and the demand for nanofabrication is becoming more diversified and refined.However,due to the diffraction limit,achieving ultrahigh-precision machining at the nanoscale has proven difficult with LDW.Traditional LDW cannot simultaneously obtain a large focal depth and high resolution because of the contradiction between the focal depth and resolution.This causes the fabrication resolution to hover around the microscale for a long time,and the acceptor material should be thick,which restricts its application in nanoscale processing.However,the acceptor materials used in traditional LDW for fabrication are limited to organic photoresists,which employ complex processing and have high material processing costs.In additio

关 键 词：激光直写 超衍射加工 多受体材料 纳米加工 

分 类 号：TN249[电子电信—物理电子学]