基于DMD的无掩模光刻图形精准性优化方法(特邀)  

Image Accuracy Optimization Method for Maskless Lithography Based on DMD(Invited)

作　　者：刘华 黄龙 刘雨晴 Liu Hua;Huang Long;Liu Yuqing(Center for Advanced Optoelectronic Functional Materials Research,Key Laboratory for UV-Emitting Materials and Technology of Ministry of Education,National Demonstration Center for Experimental Physics Education,School of Physics of Northeast Normal University,Changchun 130024,Jilin,China)

机构地区：[1]东北师范大学物理学院,先进光电功能材料研究中心,紫外发射材料与技术教育部重点实验室,国家实验物理教育示范中心,吉林长春130024

出　　处：《中国激光》2024年第12期398-408,共11页Chinese Journal of Lasers

基　　金：国家自然科学基金面上项目(62275044,61875036);济南市“新高校20条”引进创新团队项目(202228047)。

摘　　要：基于数字微镜器件(DMD)的无掩模光刻技术作为一种新兴技术在光刻领域备受关注,该技术利用DMD实现光刻掩模的数字化控制,为微纳米加工和快速原型制作提供了一种全新的解决方案。然而,在DMD无掩模光刻技术中还存在着一些问题,如投影畸变、像素化效应和邻近效应等,这些问题严重影响了光刻图形的精准性。本课题组基于多年的工作基础,全面分析了影响光刻图形质量的因素,并系统总结了几种提高光刻图案精准性的方法,包括数字掩模补偿法、像素叠加优化方法和飞秒局部修饰技术等。基于这些方法的相互配合,本课题组将投影畸变由37.7μm降低至1.7μm,将像素化效应降低为原来的1/6,将邻近效应造成的局部形变尺寸减小为1μm左右,制备出了高精准性的光刻图形。Objective Lithography is a key technology used in the processing of microelectronic chips,integrated circuits,and micro-optical components.The desired pattern is achieved through photochemical reactions or physical transformations of photosensitive materials.Maskless lithography is an advanced technique in which a digital mask pattern is directly projected onto a photosensitive material,thereby eliminating the need to employ a conventional lithography mask.The use of digital micromirror device(DMD)-based maskless lithography has garnered significant attention and has widespread applications in the field of lithography,owing to its smaller singlepixel dimensions,higher fill rate,excellent ultraviolet light durability,and faster micromirror flip-frame frequency.However,several factors can affect the accuracy of projection lithography in DMD-based maskless lithography systems,including projection distortion,pixelation,and proximity effect.In this study,we conduct a comprehensive analysis of the three factors that affect lithographic pattern quality and systematically summarize the characteristics and application scenarios of several methods to enhance lithographic pattern accuracy based on the extensive research conducted in our laboratory over the years.By integrating digital mask compensation,pixel superposition,and femtosecond local modification techniques,we successfully fabricate lithographic patterns that exhibite significantly reduced projection distortion,pixelation effects,and proximity effects.Methods A simple,convenient,and inexpensive digital correction method was used to address the problem of projection distortion in DMD lithography systems.The measured distortion values(ΔR at different radii)were fitted to obtain the corresponding curves.Subsequently,the position of each exposed pixel on the mask was corrected based on the fitting curves.To address the inherent pixelation effect of the DMD,we utilized a motion platform that carried the substrate to perform multiple microshifts in both the xand y-dire

关 键 词：投影光刻 数字微镜器件 光刻质量 飞秒激光 

分 类 号：O436[机械工程—光学工程]