基于电介质波导耦合的超分辨干涉光刻研究  

Super⁃Resolution Interference Lithography Based on Dielectric Waveguide Coupling

作　　者：李小甜 张文鹏 周毅 温中泉[1] 陈刚[1] 梁高峰 Li Xiaotian;Zhang Wenpeng;Zhou Yi;Wen Zhongquan;Chen Gang;Liang Gaofeng(Key Laboratory of Optoelectronic Technology&Systems(Chongqing University),Ministry of Education,College of Optoelectronic Engineering,Chongqing University,Chongqing 400044,China)

机构地区：[1]重庆大学光电工程学院光电技术及系统教育部重点实验室,重庆400044

出　　处：《中国激光》2024年第12期409-414,共6页Chinese Journal of Lasers

基　　金：国家自然科学基金(62275036,61927818,62105276);重庆市自然科学基金(cstc2020jcyj-msxmX0428)。

摘　　要：基于电介质波导耦合理论,本课题组提出了一种超分辨干涉光刻方法。该方法通过构建非对称波导实现了倏逝波的增强传输和干涉调控。同时,通过优化设计电介质光栅,利用波导耦合效应,形成了单一衍射级次的选频传输,获得了光场强度大、均匀性好、特征尺寸约为48.75 nm(约为0.12λ)的干涉图形。基于此方法设计的超分辨光刻器件膜层结构简单,降低了近场光刻器件的结构复杂度,提高了光利用效率。该方法为倏逝波调控提供了新思路,也拓展了超分辨光刻器件的设计原理。Objective China’s semiconductor industry is an important part of the global industrial chain,contributing to its strength in global technological progress and economic development.With technological improvements,the chip size requirements in the semiconductor industry are becoming increasingly stringent,and the degree of integration of chip preparation is increasing.Among the many links in semiconductor chip technology,lithography is the most refined.However,lithography technology is constrained by the optical diffraction limit,resulting in many problems with improving the resolution.Therefore,breaking through the diffraction limit is an important research direction for many research teams,and new super-resolution lithography technologies are rapidly being developed.However,near-field lithography,which improves the resolution by collecting evanescent waves,is the most direct and effective method for obtaining super-resolution patterns.However,current lithographic devices that manipulate evanescent waves need to resolve critical problems,such as inherent metal loss,complex multilayer film design,and low transmission efficiency.Therefore,investigating new evanescent wave control methods and designing super-resolution lithography devices with low structural complexities and high transmission efficiencies can significantly promote the development and progress of near-field super-resolution lithography.In this context,we propose super-resolution interference lithography based on dielectric waveguide coupling.Methods By selecting appropriate materials and film thicknesses,a special waveguide that presents a narrow passband in the optical transfer function(OTF)curve can be formed.During the propagation of light waves in waveguides,diffraction waves of specific orders are coupled and emitted along the transmission direction,owing to the frequency-selective transmission function of waveguides.By constructing an asymmetric waveguide,only high k diffracted waves located in the passband can pass through efficiently.If the

关 键 词：波导 电介质光栅 超分辨 干涉光刻 

分 类 号：O436[机械工程—光学工程]