基于边缘光与化学抑制方法的三维结构表面粗糙度优化研究(特邀)  

Surface Roughness Optimization of 3D Structures Based on Peripheral Photoinhibition and Chemical Quenching Method(Invited)

作　　者：高秀君 丁晨良 沈小明 詹刚垚 朱大钊 匡翠方 刘旭[1,2,3] Gao Xiujun;Ding Chenliang;Shen Xiaoming;Zhan Gangyao;Zhu Dazhao;Kuang Cuifang;Liu Xu(Research Center for Intelligent Chips and Devices,Zhejiang Lab,Hangzhou 311121,Zhejiang,China;State Key Laboratory of Extreme Photonics and Instrumentation,College of Optical Science and Engineering,Zhejiang University,Hangzhou 310027,Zhejiang,China;ZJU-Hangzhou Global Scientific and Technological Innovation Center,Hangzhou 311200,Zhejiang,China)

机构地区：[1]之江实验室智能芯片与器件研究中心,浙江杭州311121 [2]浙江大学光电科学与工程学院极端光学技术与仪器全国重点实验室,浙江杭州310027 [3]浙江大学杭州国际科创中心,浙江杭州311200

出　　处：《中国激光》2024年第12期415-421,共7页Chinese Journal of Lasers

基　　金：国家青年科学基金(52105565);浙江省自然科学基金(LQ22F050015);国家重点研发计划(2021YFF0502700);浙江省尖兵领雁研发攻关计划(2023C01051);浙江省万人计划青年拔尖人才(2020R52001);之江实验室重大科研项目(2020MC0AE01)。

摘　　要：表面粗糙度是影响激光直写技术制备微纳光学器件质量的核心参数之一,其对于曲面类光场调控微纳器件的性能来说至关重要。在传统的刻写方法中,过低的轴向分辨率会对弯曲轮廓器件的表面粗糙度产生不利影响,使其产生不必要的台阶状痕迹,从而影响器件的光学性能。目前主要采用刻写策略优化的方式降低器件的表面粗糙度,如环形扫描方法以及将表面聚合与整体曝光固化相结合的方法。本课题组分别基于边缘光抑制技术与化学抑制技术,研究了轴向刻写特征尺寸的压缩对平面结构表面粗糙度的影响。进一步,本课题组结合两种抑制技术,提出了一种通过降低轴向分辨率来降低光学器件表面粗糙度的方法,利用此方法刻写的微透镜的表面均方根粗糙度为6.84 nm。该技术为复杂光学器件制备中表面粗糙度的优化提供了参考。Objective Surface roughness is a core parameter that affects the quality of micro-and nano-optical devices prepared using laser direct writing technology.For the performance of curved surface light fields,it is crucial to regulate the performance of micro-nano optical devices.Currently,the surface roughness of a device is primarily reduced by optimizing its writing strategy.However,this method has significant limitations in the structure of micro-optical devices and is easily affected by the shrinkage rate of the photoresist,which is not conducive to the preparation of complex structures.When processing micro-nano optical devices with curved profiles,conventional methods can produce unwanted step traces on the surface,which can affect their optical properties.The axial resolution is considered a key factor affecting the step traces produced by uneven structural surfaces.Therefore,it is necessary to propose a method based on axial resolution compression to reduce the surface roughness of optical devices.Based on peripheral photoinhibition and chemical quenching technologies,this study investigates the effect of the compression of axially written feature sizes on the surface roughness of curved surface structures.Methods In this study,5 mg of 7-diethylamino-3-thenoylcoumarin(DETC),4.8 mg of bis(2,2,6,6-tetramethyl-4-piperidyl-1-oxyl)sebacate(BTPOS),and 1 g of polyhedral oligomeric silsesquioxane(POSS)were used to prepare the photoresist.A self-built writing system,in which the excitation beam was a femtosecond laser with a wavelength of 780 nm and the inhibition beam was a continuous laser with a wavelength of 532 nm,was used in the laboratory.The samples were printed using the conventional oil substrate photoresist method.A glass slide was used as the substrate and fixed onto a piezostage using a specially designed adaptor holder.The surface morphologies of the samples were characterized using a Zeiss Sigma300 scanning electron microscope.The surface roughness of the samples was characterized using a Bruker Dimens

关 键 词：激光直写 抑制剂 边缘光抑制 轴向分辨率 表面粗糙度 

分 类 号：TN249[电子电信—物理电子学]