Ag/Al_(2)O_(3)/ZnO复合膜的制备及其电磁屏蔽性能研究  

Preparation of Ag/Al_(2)O_(3)/ZnO Composite Film and Its Electromagnetic Shielding Performance

作　　者：武超 宋亚浩 WU Chao;SONG Yahao(School of Electrical Engineering and Automation,Luoyang Institute of Science and Technology,Luoyang,Henan 471023,China;School of Mathematics and Physics,Shanghai University of Electric Power,Shanghai 201306,China)

机构地区：[1]洛阳理工学院电气工程与自动化学院,河南洛阳471023 [2]上海电力大学数理学院,上海201306

出　　处：《自动化应用》2024年第15期285-287,290,共4页Automation Application

基　　金：河南省科技攻关项目2023年度课题“超宽带透明电磁屏蔽薄膜及其屏蔽效能测试系统开发”(232102211079)。

摘　　要：应用于光学窗口等军用场景的电磁屏蔽材料需要同时具备较高的电磁屏蔽性能和透光率。为实现该目标,通过磁控溅射沉积银(Ag)、氧化铝(Al_(2)O_(3))、氧化锌(ZnO)制成复合膜并比较不同结构下的综合性能。结果表明,复合膜缓解了金属的高反射导致在可见光内透光率较低的问题,保持了良好的屏蔽性能和稳定性。其中10 nm Ag/25 nm Al_(2)O_(3)/40 nm ZnO复合膜综合性能最好,方块电阻为6Ω/sq,平均透光率达到78.66%,0.01~9 GHz频带内平均电磁屏蔽为24.49 dB,最高屏蔽性能达到57 dB。Electromagnetic shielding materials used in military scenarios such as optical windows need to have high electromagnetic shielding performance and light transmittance at the same time.In order to achieve this goal,the composite films were made by magnetron sputtering to deposit silver(Ag),alumina(Al_(2)O_(3))and zinc oxide(ZnO)and compare the comprehensive properties under different structures.The results show that the composite film alleviates the problem of low light transmittance in visible light caused by high reflection of metal,and maintains good shielding performance and stability.Among them,the 10 nm Ag/25 nm Al_(2)O_(3)/40 nm ZnO composite film has the best comprehensive performance,with a block resistance of 6Ω/sq,an average light transmittance of 78.66%,an average electromagnetic shielding of 24.49 dB in the 0.01~9 GHz band,and a maximum shielding performance of 57 dB.

关 键 词：磁控溅射 电磁屏蔽 高透光性 金属与金属氧化物复合膜 透光率 

分 类 号：TQ174[化学工程—陶瓷工业]