紫外纳秒激光加工高深宽比且高一致性微槽的研究  被引量:2

Fabrication of Microgrooves with High Aspect-ratio and Uniformity by Ultraviolet Nanosecond Laser

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作  者:祝绍康 史雪松 徐龙飞 徐学锋[1] Zhu Shaokang;Shi Xuesong;Xu Longfei;Xu Xuefeng(School of Technology,Beijing Forestry University,Beijing 100083,China)

机构地区:[1]北京林业大学工学院,北京100083

出  处:《机电工程技术》2024年第8期156-160,共5页Mechanical & Electrical Engineering Technology

基  金:国家自然科学基金资助项目(51575054,51527901)。

摘  要:高深宽比微槽广泛应用于生物学以及电子学等各领域。然而,在制备高深宽比微槽时,微槽的一致性仍然是一个技术上的难题。通过一种新颖的多次扫描技术,利用355纳米纳秒激光成功制备了同时具有高深宽比和高一致性的微槽。研究了脉冲能量、离焦量和扫描次数对微槽深度和宽度的影响。结果表明:略微增加负离焦量和脉冲能量可以显著提高微槽的深宽比,但过大的脉冲能量会导致一致性下降。提出一种多次扫描的方法,通过在每次扫描的同时调整激光离焦量,制备了一组高深宽比且高一致性的微槽。所获得的微槽的平均深宽比高达6.84,深度和宽度的一致性也得到了显著提高。深度和宽度的相对标准偏差分别低至4.8%、4.4%。由于其高深宽比和高一致性,这些微槽有望在生物医学科学、3D微型电池和超疏水表面等领域得到广泛应用。High-aspect-ratio microgrooves have been widely applied in various fields,ranging from biology to electronics.However,uniformity is still a technical challenge in the fabrication of high-aspect-ratio microgrooves.Microgrooves with high aspect-ratio and uniformity are fabricated using a 355 nm nanosecond laser by a novel multiple-scan technique.The effects of pulse energy,defocusing amount,and scan number on the depth and width of microgrooves are studied.The results indicate that a slight increase in negative defocusing amount and pulse energy can significantly increase the aspect-ratio,but too large pulse energy will lead to a decrease in uniformity.Therefore,an optimized multiple-scan strategy is proposed to fabricate microgrooves with high aspect-ratio and uniformity by combining multiple processing and defocusing laser irradiations.Microgrooves with an average aspect-ratio as high as 6.84 are achieved,while depth and width uniformity are also significantly improved.The relative standard deviations(RSDs)of depth and width are as low as 4.8%and 4.4%,respectively.Due to the high aspect-ratio and uniformity,the microgrooves are expected to find broad application in fields,such as bio-medical science,3D miniature batteries,and superhydrophobic surface.

关 键 词:紫外纳秒激光 高深宽比 一致性 微槽 

分 类 号:TN249[电子电信—物理电子学]

 

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