Feature size below 100 nm realized by UVLEDbased microscope projection photolithography  

作　　者：Lei Zheng Tobias Birr Urs Zywietz Carsten Reinhardt Bernhard Roth 

机构地区：[1]Hannover Centre for Optical Technologies,Leibniz University Hannover,30167 Hannover,Germany [2]Cluster of Excellence PhoenixD(Photonics,Optics,and Engineering-Innovation Across Disciplines),30167 Hannover,Germany [3]Laboratory of Nano and Quantum Engineering,30167 Hannover,Germany [4]Bremen University of Applied Science,28199 Bremen,Germany

出　　处：《Light(Advanced Manufacturing)》2023年第4期72-81,共10页光（先进制造）（英文）

基　　金：the financial support from the German Research Foundation(DFG)under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD(EXC 2122,Project ID 390833453).

摘　　要：The demand for miniaturization and integration of optical elements has fostered the development of various micro-and nanofabrication technologies.In this work,we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication.This system can be easily implemented using off-the-shelf components.It allows for micro-and nanostructuring within seconds.By optimizing the process,a minimum feature size down to approximately 85 nm was successfully realized.In addition,investigations on fabrication of the same structures using both costly and economic microscope objectives were performed.Feature sizes below 100 nm can be stably achieved.The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics,biophotonics sensing and material science.

关 键 词：MICROFABRICATION Nanofabrication Subwavelength structuring Projection lithography UV-LED lithography 

分 类 号：TH742[机械工程—光学工程]