检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:温鑫 郑伟 顾凯凯 蔡鹏鹏 杨文杰 李霆 韩迪凯 Wen Xin;Zheng Wei;Gu Kaikai;Cai Pengpeng;Yang Wenjie;Li Ting;Han Dikai
机构地区:[1]中国电子工程设计院股份有限公司 [2]英诺赛科(苏州)半导体有限公司 [3]北京世源希达工程技术有限公司 [4]英诺赛科(珠海)科技有限公司
出 处:《洁净与空调技术》2024年第3期53-56,共4页Contamination Control & Air-Conditioning Technology
基 金:国家重点研发计划“政府间国际创新合作”重点专项(2023YFE0114100)。
摘 要:微粒子是半导体超纯水中核心的微污染控制指标,在线监测100nm和50nm粒子数浓度成为保障12英寸半导体生产工艺用水的关键措施。在超纯水制备系统的配送点(POD),激光粒子计数器(LPC)发生监测报警,影响了制备系统的运行和工艺设备的生产预警。研究简述了超纯水中颗粒物对半导体生产工艺的影响,分析了微纳气泡(MNBs)被光感应器累计测量导致计数器误判报警的原因。通过采样解吸系统(SDS)的中试试验,消除了气泡颗粒形成的83%的粒子浓度干扰,还原了真实的在线检测值(平均粒子浓度0.06pcs/mL),为半导体工厂湿法清洗的质量监控提供了稳定保障。Nanoparticles are the core micropollution control index of semiconductor ultrapurewater,and online monitoring of 100nm and 50nm particle concentration has become a key measure to ensure the water consumption of 12-inch semiconductor production process.At the point of delivery(POD)of the ultrapure water preparation system,the laser particle counter(LPC)has a monitoring alarm,which affects the operation of the ultrapure water preparation system and the production early warning of the process equipment.This study briefly describes the influence of nanoparticles in ultrapure water on semiconductor production process,and analyzes the cause of misjudgment alarm caused by the accumulation of micro and nano bubbles(MNBs)measured by optical sensor.Through the pilot test of sampling desorption system(SDS),83%of the particle concentration interference formed by the bubble particles is eliminated,and the real online value is restored(the average detection value is 0.06pcs/mL),which provides a stable guarantee for the quality control of semiconductor factory wet cleaning.
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.106