脉冲偏压和氮气分压对多弧离子镀(Zr,Cr)N薄膜结构和性能的影响  

Influence of the pulsed bias and nitrogen partial pressure on structure and properties of(Zr,Cr)N thin films prepared by multi-arc ion plating

作　　者：郭圆萌 孙艳 吴兴华 黄美东 GUO Yuanmeng;SUN Yan;WU Xinghua;HUANG Meidong(School of Physics and Materials Science,Tianjin Normal University,Tianjin 300387,China)

机构地区：[1]天津师范大学物理与材料科学学院,天津300387

出　　处：《天津师范大学学报（自然科学版）》2024年第5期11-17,共7页Journal of Tianjin Normal University：Natural Science Edition

基　　金：天津市研究生科研创新项目(2022SKYZ156)。

摘　　要：为探究基体脉冲偏压和氮气分压对(Zr,Cr)N薄膜性能的影响,采用多弧离子镀技术沉积薄膜样品,并利用扫描电子显微镜、原子力显微镜、X射线衍射仪、摩擦实验仪和表面性能实验仪对(Zr,Cr)N薄膜样品的表面形貌、物相结构、力学性能和浸润性能进行分析.实验结果表明:在保持脉冲偏压为50 V不变、改变氮气分压的实验中,氮气分压为0.3 Pa时,薄膜的表面粗糙度最小,耐磨性能最好,磨损率为1.4167×10^(-13)m^(3)/(N·m);氮气分压为0.5 Pa时,疏水性能最好,水接触角为105.42°.在保持氮气分压0.5 Pa不变、改变基体偏压的实验中,薄膜表面粗糙度随偏压的增大而减小,摩擦磨损性能得到提升,当偏压增大到-250 V时,薄膜具有最好的疏水性能,此时接触角达到106.88°.In order to investigate influence of substrate pulsed bias and nitrogen partial pressure on performance of(Zr,Cr)N,its thin films are deposited by multi-arc ion plating,and surface morphology,phase structure,mechanical properties,and wetting properties of the thin film samples were characterized using scanning electron microscopy,atomic force microscopy,X-ray diffractometer,friction tester,and surface performance tester,respectively.The experimental results show that at the fixed substrate bias voltage of-50 V,the surface roughness of the film is the smallest and the wear resistance is the best,with a wear rate of 1.4167×10^(-13)m^(3)/(N·m)as the nitrogen partial pressure is adjusted to 0.3 Pa;when the nitrogen partial pressure is 0.5 Pa,the film has the optimized hydrophobicity with a water contact angle of 105.42°.Then the nitrogen par-tial pressure is kept constant at 0.5 Pa and the various bias voltages are applied to the substrate to deposit the films.It is found that the surface roughness of the thin films decreased with the increasing bias voltage,and the friction and wear per-formance is improved.When the bias voltage is increased to-250 V,the contact angle reaches at the maximum value of 106.88°,indicating that the thin film has the optimized hydrophobic performance.

关 键 词：多弧离子镀 氮气分压 脉冲偏压 疏水性 摩擦磨损 

分 类 号：O484[理学—固体物理]