AlGaAs光电阴极表面清洗技术研究  

Study of Surface Cleaning Technology of AlGaAs Photocathode

作　　者：陈鑫龙[1] 王震 杨炳辰 贾子昕 徐智 崔佳华 张晶 周翔 CHEN Xinlong;WANG Zhen;YANG Bingchen;JIA Zixin;XU Zhi;CUI Jiahua;ZHANG Jing;ZHOU Xiang(The 55th Research Institute of China Electronic Technology Group Corporation,Nanjing 210016,CHN)

机构地区：[1]中国电子科技集团公司第五十五研究所,南京210016

出　　处：《光电子技术》2024年第3期195-202,共8页Optoelectronic Technology

基　　金：国家重点研发计划(No.2022YFF0709300)。

摘　　要：针对高Al组分AlGaAs光电阴极设计了不同清洗方法,通过XPS对不同清洗条件下的材料表面元素成分进行了测试分析,并结合SEM和高倍显微镜对光电阴极材料表面缺陷进行了分析研究。在超高真空腔体中进行了透射式AlGaAs光电阴极及其像增强管的制备,测试了器件的光谱响应曲线和图像质量。结果表明,采用H_(2)SO_(4)/H_(2)O_(2)/H_(2)O溶液和HCl/H_(2)O溶液的化学清洗工艺,结合等离子体物理清洗工艺,可有效去除AlGaAs表面的氧化物、有机颗粒和杂质C,提升器件的光谱灵敏度和图像质量。Different cleaning methods were designed for AlGaAs photocathodes with high Al fraction.The surface element compositions of AlGaAs materials under different cleaning conditions were measured and analyzed by XPS.Surface defects of AlGaAs photocathodes were measured by SEM and high-powered microscope.The AlGaAs photocathodes were prepared and the image intensifier tubes were sealed in an ultra-high vacuum chamber,and the spectral response and image quality of tubes were obtained.The results showed that the chemical cleaning methods combined of H_(2)SO_(4)/H_(2)O_(2)/H_(2)O and HCl/H_(2)O solution and followed by plasma physical cleaning could remove oxides,organic particles,and carbons of AlGaAs surface,which would increase spectral response and image quality of image intensifier tubes.

关 键 词：铝镓砷光电阴极 超高真空 光谱响应 化学清洗 

分 类 号：TN223[电子电信—物理电子学] O462.3[理学—电子物理学]