不同偏压的Cr离子刻蚀对TiAlN涂层硬质合金的影响  

Effect of Cr Ion Etching with Different Bias Voltages on TiAlN Coated Cemented Carbide

作　　者：向艺桐 熊计[1] 向清洲 郭智兴[1] Xiang Yitong;Xiong Ji;Xiang Qingzhou;Guo Zhixing

机构地区：[1]四川大学机械工程学院,成都市610065

出　　处：《工具技术》2024年第11期23-29,共7页Tool Engineering

基　　金：四川省科技计划(23ZHCG0030,2023YFG0078,23ZHCG0049)。

摘　　要：本文采用阴极电弧沉积技术在不同偏压下进行Cr离子刻蚀硬质合金,并在其表面沉积TiAlN涂层,研究不同偏压下的Cr离子刻蚀对涂层硬质合金的影响。Cr离子刻蚀后,硬质合金基体表面粗糙度显著增加,且在基体表面能检测到更多的Cr元素;Cr离子刻蚀可在清洁基板的同时增加基体表面粗糙度,使得涂层与基体间的机械互锁增强,进而提高结合力;从涂层与基体界面的HR-TEM图像可以发现,在Cr离子刻蚀处理后的基体上涂层呈外延生长,有利于提高结合强度。此外,当刻蚀偏压为-200V时,基体表面沉积的Cr层能够降低涂层与基体间的残余应力,可将涂层与基体的结合力从61N提高至77N。随着刻蚀偏压的提高,涂层硬质合金的耐磨性增加,其磨损机理为磨料磨损和黏着磨损。Based on the cathodic arc deposition technique,Cr ions are used to etch cemented carbide at different bias voltages and deposit TiAlN coatings on it.The effect of Cr ion etching on coated cemented carbide at different bias voltages is investigated.After etching,the surface roughness of the cemented carbide substrate increases significantly,and more Cr elements can be detected on the surface of the substrate.Cr ion etching cleaned the substrate surface and produced a more uneven topography,resulting in enhanced mechanical interlocking between the coating and the substrate,which in turn improves the adhesion.The HR-TEM image of interface reveals that the coating grows epitaxially on the Cr ion etched treated substrate,which is beneficial to improve the adhesive strength.In addition,when the etching bias is-200V,the Cr layer deposited on the substrate surface also reduces the residual stress between the coating and the substrate,which can increase the adhesive strength of the coating to the substrate from 61N to 77N.The wear resistance of coated carbide tends to increase as the etching bias increases,and the wear mechanism is abrasive wear and adhesive wear.

关 键 词：离子刻蚀 TIALN 硬质合金 阴极电弧沉积 

分 类 号：TG71[金属学及工艺—刀具与模具] TH16[机械工程—机械制造及自动化]