退火温度对铁酸铋薄膜光学性质的影响  

Effects of Optical Properties of Bismuth Ferrite Thin Films

作　　者：朱德明 ZHU Deming(Jiangxi Key Laboratory of Advanced Copper-based Materials,Nanchang 330096,Jiangxi,China;Institute of Applied Physics,Jiangxi Academy of Sciences,Nanchang 330096,Jiangxi,China)

机构地区：[1]铜基新材料江西省重点实验室,江西南昌330096 [2]江西省科学院应用物理研究所,江西南昌330096

出　　处：《热处理技术与装备》2024年第6期17-20,25,共5页Heat Treatment Technology and Equipment

摘　　要：分别在硅衬底和石英衬底上使用射频磁控溅射法制备铁酸铋(BiFeO_(3))薄膜,主要研究退火温度对BiFeO_(3)薄膜的形貌、成分及光学性质的影响。试验结果表明,不同温度退火处理后,BiFeO_(3)薄膜的晶粒尺寸明显变大,且成分发生了较大变化;通过测试BiFeO_(3)薄膜的透射谱和反射谱,发现退火温度为450℃时,其禁带宽度最窄。The bismuth ferrite(BiFeO_(3))thin films were prepared on silicon substrate and quartz substrate by radio frequency magnetron sputtering,respectively.The influence of annealing temperature on the morphology,composition and optical properties of BiFeO_(3)thin films was studied.Experimental results showed that the grain size of BiFeO_(3)thin films increased and composition changed greatly after annealing at different temperatures.By testing the transmission and reflection spectra of BiFeO_(3)thin films,it was found that BiFeO_(3)thin films had the narrowest bandgap when the annealing temperature was 450℃.

关 键 词：铁酸铋薄膜 磁控溅射 退火温度 光学性质 

分 类 号：TG156.2[金属学及工艺—热处理]