光刻胶喷雾涂覆工艺研究  

Research on Spray Coating Process

作　　者：郑如意 吕磊[1] 刘玉倩[1] ZHENG Ruyi;LU Lei;LIU Yuqian(The 45^(th) Research Institute of CETC,Beijing 100176,China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2024年第6期10-15,31,共7页Equipment for Electronic Products Manufacturing

摘　　要：影响光刻胶喷雾涂覆胶膜厚度和均匀性的因素众多,主要因素有光刻胶浓度(影响液体黏度)、光刻胶流量、氮气压力、扫描速度、轨迹行距、喷头高度、叠加次数、卡盘温度等,另外腔体排风大小、氮气流量、喷头类型(雾化方式和雾化效果)、烘焙温度及时间等也会影响工艺效果。为解决使用喷雾涂覆工艺对基底涂胶时表面粗糙导致的均匀性差的问题,采用正交试验的方法进行了大量的工艺探索。同时,为了更好地了解各项工艺指标及喷涂过程,简要介绍了光刻胶喷雾涂覆设备。试验结果显示,最优工艺条件下,涂胶厚度为5μm时,均匀性可达±4.8%。There are many factors that affect the thickness and uniformity of spray coating.The main factors are photoresist concentration(affecting liquid viscosity),photoresist flow,nitrogen pressure,scanning speed,track line spacing,nozzle height,stacking times,chuck temperature,etc.In addition,the size of cavity exhaust,nitrogen flow,nozzle type(atomization method and effect),baking temperature and time could also affect the process effect of spray coating.In order to solve the problem of poor uniformity caused by rough surface when spray coating is applied to the substrate,a large number of process explorations are carried out by means of orthogonal test.At the same time,in order to better understand the process indicators and spraying process,the spray coating equipment is briefly introduced.The experimental results show that under the optimal process conditions,the coating thickness is at 5滋m,the uniformity can reach 4.8%.

关 键 词：光刻工艺 喷雾涂覆工艺 均匀性 正交试验 

分 类 号：TN305[电子电信—物理电子学]