粒度分布对Cu包覆SiC颗粒相分布均匀性的影响  

Influence of Particle Size-Distribution on the Phase Homogeneity between SiC Particles and Cu Coating

作　　者：张锐[1] 高濂[1] 虞玲[1] 郭景坤[1] 

机构地区：[1]中国科学院上海硅酸盐研究所国家重点实验室

出　　处：《无机材料学报》2002年第6期1311-1314,共4页Journal of Inorganic Materials

摘　　要：利用歧化反应原理,在SiC颗粒表面包覆金属Cu.通过俄歇电子能谱(AES),分析粒度分布对Cu包覆SiC颗粒相分布均匀性的影响.SiC颗粒的粒度分布范围过宽,Cu倾向于包覆在大颗粒表面而无法分散到细小颗粒表面.减小粒度分布范围,纳米SiC颗粒同样能被Cu均匀包覆.应当控制纳米SiC颗粒在一个较小的分布范围,以保证理想的Cu包覆效果和两相分散均匀性.Based on the disproportionation reaction, Sic particles were coated with Cu. AES technology was carried out to determine the influence of size-distribution on the phase homogeneity between Sic and Cu. Cu tends to deposit on the large particles rather than on the very fine coexisted particles in a wide size-distribution powders. Nano SiC particles can be coated readily with the narrow particle size- distribution, which leads to the desired phase homogeneity.

关 键 词：Cu包覆SiC颗粒 表面包覆 分散均匀性 粒度分布 歧化反应 铜 碳化硅 陶瓷颗粒 复合材料 

分 类 号：TG164.453[金属学及工艺—热处理] TB[金属学及工艺—金属学]