氧气流量对等离子体增强化学气相沉积硅氧烷涂层的防原子氧性能的影响  

Effect of Oxygen Flow Rate on Atomic Oxygen Resistance Performance of Siloxane Coatings Deposited by Plasma-Enhanced Chemical Vapor Deposition

作　　者：王虎[1] 王兰喜[1] 周晖[1] 李学磊[1] 杨淼[1] 李坤[1] 倪壮 李中华[1] 王志民[1] 左华平[1] 何延春[1] WANG Hu;WANG Lanxi;ZHOU Hui;LI Xuelei;YANG Miao;LI Kun;NI Zhuang;LI Zhonghua;WANG Zhimin;ZUO Huaping;HE Yanchun(Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730000,China)

机构地区：[1]兰州空间技术物理研究所,真空技术与物理重点实验室,兰州730000

出　　处：《硅酸盐学报》2025年第1期1-9,共9页Journal of The Chinese Ceramic Society

基　　金：国家重点研发计划(2022YFB3806300)。

摘　　要：低轨环境下的原子氧是造成聚酰亚胺薄膜被剥蚀失效的关键因素,硅氧烷涂层是对聚酰亚胺薄膜进行空间原子氧防护的重要手段。利用等离子体增强化学气相沉积的方法在聚酰亚胺薄膜基材上在不同氧气流量下制备了硅氧烷涂层,研究了氧气流量对涂层的沉积速率、断面形貌和成分的影响,对涂层样品开展了原子氧作用试验并测定了试验后的质量损失及表面形貌。研究结果表明,随着氧气流量的增加,涂层中的有机基团逐渐减少,同时SiO_(x)结构逐渐增多。经原子氧暴露试验发现,涂层中的有机基团易与原子氧发生反应形成气态产物,造成较高的质量损失,表现出涂层的质量损失随着氧气流量的增加呈现出指数衰减趋势。然而,过高的氧气流量下制备的涂层可能会具有较高的结构应力,使其在原子氧作用时产生裂纹,表现出质量损失的急剧升高。Introduction Polyimide film is one of the most commonly used organic film materials for spacecrafts.In the low-Earth orbit(LEO)environment,the polyimide film applied to the surface of spacecraft will be eroded by atomic oxygen.Generally,performance failure will occur in about one year due to the erosion effect,affecting the service life of spacecrafts.The siloxane coating prepared by plasma-enhanced chemical vapor deposition(PECVD)method has good atomic oxygen resistance,which can reduce the atomic oxygen erosion rate of polyimide film to less than one-thirtieth.At the same time,the coating also has good light transmittance,flexibility and bendability.In recent years,there have been many studies on the effects of electrode spacing,power,pressure and other parameters on the properties of siloxane coatings prepared by PECVD at home and abroad,but the effect of oxygen flow rate on the atomic oxygen resistance of siloxane coatings has not been reported.This work focuses on the deposition rate,cross-sectional morphology,composition and structure of siloxane coatings prepared by PECVD under different oxygen flow rates.The atomic oxygen effect test was carried out on the coatings,and the mass loss data of different samples were successfully collected.The oxygen flow rate parameters of coatings with excellent atomic oxygen resistance has been obtained,which provides support for the research of atomic oxygen resistant coatings.Methods The coating samples were prepared by the PECVD method using a self-developed continuous roll-to-roll PECVD coating equipment.The substrate material for coating was 50μm thick DuPont Kapton HN polyimide film.The reactant gases were Alfa Aesar hexamethyldisiloxane monomer(HMDSO)and oxygen(O_(2)).With a fixed HMDSO flow rate of 25 mL/min,the O_(2)flow rate was adjusted to 4,8,12,16,20,and 24 mL/min respectively,while maintaining a deposition pressure of 8 Pa and a reaction power of400 W.This setup was used to investigate the deposition rate,structure and composition of deposited coatings under

关 键 词：氧气流量 等离子体增强化学气相沉积 硅氧烷 涂层 防原子氧 

分 类 号：V45[一般工业技术—材料科学与工程]