基于洁净真空的半导体测试设备的研发  

Research and Development of Semiconductor Test Equipment Based on Clean Vacuum

作　　者：唐榕 卢少波 韩永超 TANG Rong;LU Shaobo;HAN Yongchao(Beijing Vacuum Electronic Technology Co.,Ltd.,Beijing 100015,China)

机构地区：[1]北京真空电子科技有限公司,北京100015

出　　处：《真空》2025年第1期62-66,共5页Vacuum

摘　　要：半导体设备的洁净度对器件性能极为重要,真空环境下悬浮颗粒和残余气体含量低,更接近于真正的清洁真空。洁净真空环境的获得与保持是半导体工业生产的关键,涉及多种学科和技术。本文从腔室材料选择、腔室设计和制造、内表面清洗和检测技术、包装和转运等方面详细介绍了洁净真空系统工艺设备的研制过程。所研发的设备在带载情况下可快速获得1×10^(-4)Pa工作真空度,残余气体和颗粒度指标均满足工艺要求。The cleanliness of the equipment is extremely important for semiconductor device performance.In the test equipment,the vacuum environment has lower suspended particles and residual gas content,which is closer to the true clean vacuum.The acquisition and maintenance of the clean vacuum is a key technology of semiconductor industry production,involving a variety of techniques.This paper introduces the development process of clean vacuum system technology equipment from the aspects of chamber material selection,chamber design and manufacture,cleaning and testing of internal surfaces,packaging and transshipment.The developed equipment can quickly obtain a working vacuum degree of 1×10^(-4)Pa under load,and the residual gas and particle size indicators meet the process requirements.

关 键 词：洁净真空 半导体 颗粒度 超高真空 

分 类 号：TH69[机械工程—机械制造及自动化]