应用GPC-PLC-PID的电镀线镀槽液温度抗干扰稳定控制方法  

Application of GPC-PLC-PID for temperature anti interference and stable control of electroplating bath solution in electroplating line

作　　者：方小明 刘艳梨 田大海 Fang Xiaoming;Liu Yanli;Tian Dahai(Jiangsu College of Safety Technology,Xuzhou 232001,China;School of Information and Control Engineering,China University of Mining and Technology,Xuzhou 232001,China)

机构地区：[1]江苏安全技术职业学院,江苏徐州232001 [2]中国矿业大学信息与控制工程学院,江苏徐州232001

出　　处：《电镀与精饰》2025年第2期99-105,共7页Plating & Finishing

基　　金：国家自然科学基金项目“柔性并联机器人辅助细胞微操作系统的设计与容错定位技术研究”(51975277)。

摘　　要：在电镀线镀槽液化学反应热效应干扰下,电镀线镀槽需要不断补偿散失热量或增加冷却负荷以维持槽液设定温度,难以在每个电镀反应周期内对温度变化进行稳定控制,导致温度控制偏差较大。为此,提出应用GPCPLC-PID的电镀线镀槽液温度抗干扰稳定控制方法。考虑电镀反应温度变化,基于灵敏度系数校准电镀线镀槽液温度传感数据,能够在温度干扰下捕捉温度变化;在PLC控制器上,运用广义预测控制方法(Generalized Predictive Control,GPC)预测镀槽在化学反应热效应干扰下补偿热量或增强冷却时的温度变化趋势,对温度控制律进行校正滚动抗干扰优化;将最优控制律输出的温度调整实时扰动偏差前馈值作为PID控制器的输入,通过前馈偏差补偿跟踪响应温度变化,实现电镀线镀槽液温度抗干扰稳定控制。实验结果表明,所提方法能够准确感知电镀线镀槽液温度,通过GPC预测电镀线镀槽液温度变化趋势,降低了电镀线镀槽液温度控制的偏差,增强了控制抗干扰能力,为电镀线镀槽液温度稳定控制提供了强大支撑。Under the interference of chemical reaction heat effect in the plating tank solution of the electroplating line,the plating tank of the electroplating line needs to continuously compensate for the heat loss or increase the cooling load to maintain the set temperature of the tank solution.It is difficult to stably control the temperature change during each electroplating reaction cycle,resulting in significant temperature control deviation.Therefore,a method for anti-interference and stable control of plating bath temperature in electroplating lines using GPC-PLC-PID is proposed.Considering the temperature changes in electroplating reactions,calibrating the temperature sensing data of the plating solution in the electroplating line based on sensitivity coefficients can capture temperature changes under temperature interference;On the PLC controller,the Generalized Predictive Control(GPC)method is used to predict the temperature change trend of the plating tank during compensating heat or enhancing cooling under the interference of chemical reaction thermal effects,and the temperature control law is calibrated and optimized for rolling anti-interference;The real-time disturbance deviation feed forward value output by the optimal control law is used as the input of the PID controller for temperature adjustment.Through feed forward deviation compensation,the response temperature changes are tracked to achieve antiinterference and stable control of the plating solution temperature in the electroplating line.The experimental results show that the proposed method can accurately perceive the temperature of the plating solution in the electroplating line,predict the trend of temperature changes in the plating solution through GPC,reduce the deviation of temperature control in the plating solution,enhance the anti-interference ability of control,and provide strong support for stable temperature control of the plating solution in the electroplating line.

关 键 词：PID控制器 PLC技术 广义预测控制方法 温度传感器 温度控制 

分 类 号：TP273[自动化与计算机技术—检测技术与自动化装置]