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作 者:黄费慧 林煜生 刘飞龙 HUANG Feihui;LIN Yusheng;LIU Feilong(Guangzhou China Star Optoelectronics Semiconductor display Technology,Guangdong 511356,China;School of Electrical Engineering,Guangzhou Railway Polytechnic,Guangzhou,Guangdong 511300,China)
机构地区:[1]广州华星光电半导体显示技术有限公司,广东511356 [2]广州铁路职业技术学院电气工程学院,广东511300
出 处:《集成电路应用》2024年第11期13-15,共3页Application of IC
摘 要:阐述薄膜晶体管液晶显示器中彩膜滤光片的拼接曝光工艺。针对传统马赛克拼接设计shot数量多,产能成本大等问题,通过工艺上增加平坦层等措施减少拼接处两边高度差异,拼接处监控特性制程能力提升也减少拼接处两边曝光差异,从而可以在拼接区采用直接拼接,有效减少曝光shot数量。This paper describes the splicing exposure process of color film filters in thin-film transistor liquid crystal displays.In response to the problems of large number of shots and high production cost in traditional mosaic splicing design,measures such as adding flat layers in the process can be taken to reduce the height difference between the two sides of the splicing area.The monitoring characteristics of the splicing area can also be improved to reduce the exposure difference between the two sides of the splicing area.Therefore,direct splicing can be adopted in the splicing area,effectively reducing the number of exposure shots.
关 键 词:大尺寸显示 TFT-LCD 彩色滤光片 马赛克拼接 直接拼接
分 类 号:TN873[电子电信—信息与通信工程]
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