Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant  

作　　者：Jingtong Feng Rao Xu Ziruo Wu Lihua Lei Yingfan Xiong Zhaohui Tang Guangxu Xiao Yuying Xie Dongbai Xue Xiao Deng Xinbin Cheng Tongbao Li 冯婧桐;徐娆;吴子若;雷李华;熊英凡;唐朝辉;肖光旭;解钰莹;薛栋柏;邓晓;程鑫彬;李同保

机构地区：[1]National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry(Shanghai),Tongji University,Shanghai 200092,China [2]Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China [3]MOE Key Laboratory of Advanced Micro-Structured Materials,Tongji University,Shanghai 200092,China [4]Shanghai Frontiers Science Center of Digital Optics,Tongji University,Shanghai 200092,China [5]Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications,Tongji University,Shanghai 200092,China [6]School of Physics Science and Engineering,Tongji University,Shanghai 200092,China [7]Shanghai Metric Optics Technology Co.,Ltd.,Shanghai 201108,China [8]Shanghai Institute of Measurement and Testing Technology,Shanghai 201203,China

出　　处：《Chinese Physics B》2025年第2期82-88,共7页中国物理B(英文版)

基　　金：Project supported by the National Natural Science Foundation of China (Grant Nos. 61925504 and 52475563);the National Key Research and Development Program of China (Grant Nos. 2022YFF0607600 and 2022YFF0605502);Key Laboratory of Metrology and Calibration Technology Fund Project (Grant No. JLKG2023001B001);Aeronautical Science Foundation Project (Grant No. 20230056038001)。

摘　　要：Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a ‘top-down’ calibration approach and a Si lattice constant calibration system characterized by a ‘bottom-up’ calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.

关 键 词：NANOMETROLOGY self-traceable standard material Si lattice constant 

分 类 号：TN253[电子电信—物理电子学] TB9[一般工业技术—计量学]