NANOMETROLOGY

作品数：9被引量：2H指数：1
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相关领域：机械工程一般工业技术更多>>
相关作者：张萍萍马艳李同保陈张海更多>>
相关机构：国家工程研究中心复旦大学同济大学更多>>
相关期刊：《Journal of Microelectronic Manufacturing》《生物物理学报》《Nanomanufacturing and Metrology》《Modern Instrumentation》更多>>
相关基金：国家自然科学基金更多>>
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Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant
《Chinese Physics B》2025年第2期82-88,共7页Jingtong Feng Rao Xu Ziruo Wu Lihua Lei Yingfan Xiong Zhaohui Tang Guangxu Xiao Yuying Xie Dongbai Xue Xiao Deng Xinbin Cheng Tongbao Li 
Project supported by the National Natural Science Foundation of China (Grant Nos. 61925504 and 52475563);the National Key Research and Development Program of China (Grant Nos. 2022YFF0607600 and 2022YFF0605502);Key Laboratory of Metrology and Calibration Technology Fund Project (Grant No. JLKG2023001B001);Aeronautical Science Foundation Project (Grant No. 20230056038001)。
Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents ...
关键词：NANOMETROLOGY self-traceable standard material Si lattice constant 
Supramolecular host–guest self-assembled monolayers as a new generation of nanoscale ruler under the reform of SI units
《Nano Research》2025年第2期455-463,共9页Jianqiao Li Yufei Zhang Yushu Shi Ke Deng Qingdao Zeng 
This work was supported by the National Key Research and Development Program of China(No.2021YFA1202801);the National Natural Science Foundation of China(No.22272039);the Strategic Priority Research Program of Chinese Academy of Sciences(No.XDB36000000);the AKYCX2309 fund of National Institute of Metrology China;Jilin Chinese Academy of Sciences-Yanshen Technology Co.Ltd.
Si lattice-based linewidth,as the most used calibrator in the semiconductor industry,failed to meet the nanoscale demands of critical dimensions(CD).In 2018,the Si(220)lattice spacing was recommended as a secondary re...
关键词：supramolecular self-assembly monolayers nanoscale rulers calibration NANOMETROLOGY scanning tunneling microscopy 
Semiconductor Multilayer Nanometrology with Machine Learning被引量：2
《Nanomanufacturing and Metrology》2023年第2期37-54,共18页Hyunsoo Kwak Jungwon Kim 
Funding National Research Foundation of Korea(Grants 2021R1A2B5B03001407 and 2021R1A5A1032937).
We review the measurement methods and thickness characterization algorithms of semiconductor multilayer devices.Today’s ultrahigh-density,high-energy-efficient three-dimensional semiconductor devices require an itera...
关键词：Semiconductor multilayer devices Electron microscopy SPECTROPHOTOMETRY Spectroscopic ellipsometry Raman spectroscopy Thickness characterization Machine learning 
Correction of Interferometric High-Order Nonlinearity Error in Metrological Atomic Force Microscopy
《Nanomanufacturing and Metrology》2022年第4期412-422,共11页Gaoliang Dai Xiukun Hu 
Open Access funding enabled and organized by Projekt DEAL.
Metrological atomic force microscopes(Met.AFMs)with built-in interferometers are one of the main workhorses for versatile dimensional nanometrology.The interferometric nonlinearity error,particularly the high-order(i....
关键词：Dimensional nanometrology Traceable calibration Metrological atomic force microscopy INTERFEROMETRY Nonlinearity error Step height 
Monte Carlo method in optical atomic force microscopy
《Journal of Measurement Science and Instrumentation》2021年第3期267-271,共5页Ahemd ElMelegy Sarwat Zahwi 
National Institute of Standards(NIS),11211,Egypt。
Scanning probe microscopy(SPM)is a branch of microscopy that forms images of surfaces using a physical probe that scans the specimen.Atomic force microscopy is one of the SPM family which is considered as a very versa...
关键词：MEASUREMENT Monte Carlo method atomic force microscope(AFM) NANOMETROLOGY 
Laser-Driven Light Sources for Nanometrology Applications
《Journal of Microelectronic Manufacturing》2019年第1期27-31,共5页Huiling Zhu Paul Blackborow 
Laser-driven light sources(LDLS)have ultrahigh-brightness and broad wavelength range.They are ideal radiation sources for optical metrology tools for advanced process control in semiconductor manufacturing.LDLS source...
关键词：LASER-DRIVEN BRIGHTNESS BROADBAND deep-UV METROLOGY LDLS 
Towards Quantitative Characterisation of the Small Force Transducer Used in Nanoindentation Instruments
《Modern Instrumentation》2013年第4期61-67,共7页Zhi Li Uwe Brand 
Quantitative characterization of the mechanical properties of materials in micro-/nano-scale using depth-sensing indentation technique demands high performance of nanoindentation instruments in use. In this paper, the...
关键词：NANOMETROLOGY NANOINDENTATION Instrument Nano-Force TRANSDUCER Microelectromechanical Systems Nano-Force Calibration 
Up-to-date issues and strategies for developing nanometrology standards
《生物物理学报》2009年第S1期171-172,共2页Yan FANG1, Xinju Yang2 Zhanghai Chen2 1 Zhong Shan Hospital,Fudan University, Shanghai XuHui Region 200032 136 Yi Xue Yuan Road 2 Fudan University, Shanghai YangPu Region 200433 220 Han Dan Road 
Yan Fang acknowledges research grants from Shanghai Technology Committee (STC) 03JC14020 &0452nm085;National Science Foundation of China (NSFC) 30470409;Shanghai Xu Hui Region of Science and Technology Committee RCT2008010
Unbroken chain of traceability is currently unsettled issues for developing national/ international nanometer scale metrology standards. The present paper will address
关键词：NANOMETROLOGY Methods STANDARDS TRACEABILITY 
Precision nanometrology of a large area microstructured metrology surface
《光学精密工程》2003年第3期223-226,共4页WEIGao TAKESHIAraki SATOSHIKiyono 
supported by agrant from Ministry of Education, Culture,Sports, Science and Technology of Japan(MEXT)
1 IntroductionThe authors have been working on a newsurface encoder for detecting multi-degree-of-freedom(MDOF) translational and tilt motionsof precision stages[1]. The surface encoder con-sists of two fundamental el...
关键词：表面形貌测量 计量学 表面编码器 显微结构 精密度 角度传感器 纳米制造系统 
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