高纯钽靶材的制备及其织构研究  

Study on Preparation and Texture of High Purity Tantalum Targets

作　　者：吴孟海 余涛[1] 朱芳 冯美兵 杨嘉奇 WU Meng-hai;YU Tao;ZHU Fang;FENG Mei-bing;YANG Jia-qi(International Institute of Materials Innovation,Nanchang University,Nanchang 330031,China;Jiujiang Tanbre Co.,Ltd.,Jiujiang 332014,China;Changsha Wing High-Tech New Materials Co.,Ltd.,Changsha 410221,China)

机构地区：[1]南昌大学国际材料创新研究院,江西南昌330031 [2]九江有色金属冶炼有限公司,江西九江332014 [3]长沙伟徽高科技新材料有限公司,湖南长沙410221

出　　处：《稀有金属与硬质合金》2025年第1期81-88,共8页Rare Metals and Cemented Carbides

摘　　要：根据国内外文献分析了晶粒度和织构对钽靶材溅射产出率的影响,认为晶粒细小且均匀的钽靶材具有较高的溅射产出率。采用高纯钽锭通过大变形锻造并结合轧制和真空退火制备钽靶材,并借助金相显微镜和EBSD技术对钽靶材的微观组织、晶粒度和织构组成进行了分析。结果表明:通过增大铸锭锻造变形量可使钽靶材在厚度方向获得细小而均匀的晶粒,同时织构在厚度方向均匀地随机分布。Based on the domestic and foreign literature,the influence of grain size and texture on the sputtering yield of tantalum targets is analyzed,and it is considered that the tantalum target with fine and uniform grains has relatively high sputtering yield.High purity tantalum ingots were used to prepare tantalum targets through large deformation forging combined with rolling and vacuum annealing.The microstructure,grain size,and texture composition of the tantalum targets were analyzed using metallographic microscope and EBSD technology.The results indicate that by increasing the forging deformation of the ingot,the tantalum target can obtain fine and uniform grains in the thickness direction,and its texture is uniformly distributed randomly in the thickness direction.

关 键 词：高纯钽靶材 溅射产出率 大变形锻造 热处理 织构 晶粒度 

分 类 号：TG146.416[一般工业技术—材料科学与工程]