Extreme sputtering:Epitaxy of multifunctional oxides heterostructures  

作　　者：Soo Young Jung Dong-Hun Han Ruiguang Ning Min-Seok Kim Hyung-Jin Choi Ho Won Jang Seung-Hyub Baek 

机构地区：[1]Electronic Materials Research Center,Korea Institute of Science and Technology(KIST),Seoul 02792,Republic of Korea [2]Department of Materials Science and Engineering,Research Institute of Advanced Materials,Seoul National University,Seoul 08826,Republic of Korea [3]Division of Nano&Information Technology,KIST School,University of Science and Technology,Seoul 02792,Republic of Korea [4]Advanced Institute of Convergence Technology,Seoul National University,Suwon 16229,Republic of Korea

出　　处：《Journal of Advanced Ceramics》2024年第12期1919-1930,共12页先进陶瓷(英文)

基　　金：the National Research Foundation of Korea(NRF)grant funded by the Ministry of Science and ICT(No.NRF-2020M3D1A2101933);from Korea Institute of Science and Technology(No.2E33181);supported by Alchemist Project Program(No.RS-2024-00422061,Development of Ultimate Semiconductor by Control of Band Curvature of Ultrawide Bandgap Materials)funded by the Ministry of Trade,Industry&Energy(MOTIE,Republic of Korea).

摘　　要：This review provides an in-depth exploration of low-damage sputtering techniques and their importance in synthesizing high-quality epitaxial multifunctional oxide heterostructures.This review examines the factors contributing to damages during sputtering and introduces strategies for minimizing these detrimental effects.Prominent examples are provided to illustrate key milestones in the development of the sputtering technique,addressing critical issues such as maintaining stoichiometry when volatile species are included,achieving precise atomic-level control of interfaces,integrating an additional anion into oxides,selecting a particular phase from many possible polymorphs,and controlling the microstructure of thin films.Additionally,various defect mitigation strategies are discussed,including the use of miscut substrates,in-situ monitoring systems,and chemical buffer layers.By shedding light on the advancements and limitations in sputtering,this review not only enhances our present understanding of thin film deposition but also paves the way for future innovative sputtering techniques,holding tremendous potential for the exploration of new materials and their applications in various industries.

关 键 词：SPUTTERING low damage ion bombardment epitaxial thin films functional oxides 

分 类 号：TG1[金属学及工艺—金属学]