荷能离子作用对氧化铝颗粒表面类金刚石薄膜生长特性的影响  

Influence of Energetic Ion Effects on the Growth Characteristics of Diamond-Like Films on Alumina Particle Surfaces

作　　者：安政杰 赵军平[1,2] 艾志军 吴治诚 张乔根[1,2] AN Zhengjie;ZHAO Junping;AI Zhijun;WU Zhicheng;ZHANG Qiaogen(School of Electrical Engineering,Xi’an Jiaotong University,Xi’an 710049,China;State Key Laboratory of Electrical Insulation and Power Equipment,Xi’an Jiaotong University,Xi’an 710049,China)

机构地区：[1]西安交通大学电气工程学院,西安710049 [2]西安交通大学电工材料电气绝缘全国重点实验室,西安710049

出　　处：《西安交通大学学报》2025年第3期189-200,共12页Journal of Xi'an Jiaotong University

基　　金：国家自然科学基金资助项目(U2066216)。

摘　　要：为掌握表面改性氧化铝颗粒的过程中颗粒表面类金刚石薄膜形貌的调控方法,基于空心阴极放电等离子体表面沉积系统,研究了不同形式的外施电压作用下,生长在氧化铝颗粒表面的类金刚石膜层的形貌特征及不同膜层形貌的形成机制。通过对在不同条件下沉积的类金刚石膜层的形貌观测发现,直流电压作用下,膜层会完全保留颗粒的本征形貌特征;脉冲电压作用下,膜层表面存在大量岛状凸起结构,并基于膜层的生长模式和荷能离子与基底发生的相互作用分析了膜层会出现上述两种形貌的原因。当膜层尚未完全覆盖氧化铝时,化学键键能的差异使得碳原子在氧化铝表面会倾向于形成岛状结构,基底表面电荷积聚引起的离子通量密度空间不均匀分布则会使得膜层趋于均匀生长。当膜层完全覆盖氧化铝后,高能离子会引发膜层表面碳原子产生横向位移,使得膜层趋于平滑。为使类金刚石膜层能够在氧化铝颗粒表面形成岛状结构,应限制脉冲电压的占空比及电压幅值,以限制积聚的电荷量,同时应降低能量大于350 eV的离子占比,使得岛状结构能够保留。研究结果表明,通过调控制备参数在氧化铝粉体颗粒表层沉积具有岛状结构的类金刚石膜层可提高颗粒比表面积,有利于改善颗粒与环氧树脂基体的结合性能。To understand the method of controlling the morphology of diamond-like carbon(DLC)films on the surface of alumina particles during surface modification,this paper,based on a hollow cathode discharge plasma surface deposition system,investigates the morphological characteristics of DLC film layers grown on alumina particles surfaces under the influence of different forms of applied voltage and the formation mechanism of different film layer morphologies.Observations of the morphology of diamond-like film layers deposited under different conditions reveal that under the action of DC voltage,the film layer completely retains the intrinsic morphology of the particles;while under the action of pulse voltage,numerous island-like protrusions appear on the film surface.The reasons for the occurrence of these two types of film morphologies are analyzed based on the growth mode of the film layer and the interaction between energetic ions and the substrate.When the film layer is not fully covering the alumina,the difference in chemical bonding energy causes carbon atoms to preferentially form island-like structures on the surface of alumina,and the uneven spatial distribution of ion flux density caused by charge accumulation on the substrate surface leads to uniform film growth.On the other hand,when the film layer completely covers the alumina,high-energy ions induce lateral displacement of carbon atoms on the film surface,resulting in a smoother film texture.To facilitate the formation of island-like structures for diamond-like film layers on alumina particles’surfaces,it is necessary to limit the duty cycle and voltage amplitude of pulse voltage to control the accumulated charge,and reduce the proportion of ions with energies exceeding 350 eV so that the island-like structures can be preserved.By adjusting the deposition parameters to deposit diamond-like carbon film layers with island-like structures on the surface of alumina powder particles,the specific surface area of the particles can be increased,which is benefic

关 键 词：类金刚石薄膜 空心阴极放电 外施电压作用 形貌特征 岛状结构 

分 类 号：TN305.8[电子电信—物理电子学]